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Characterization of inhomogeneous transparent thin films on transparent substrates by spectroscopic ellipsometry: refractive indices n(λ) of some fluoride coating materials

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Abstract

By incorporation of an achromatic three-reflection quarterwave retarder to a spectroscopic ellipsometer and application of appropriate calibration and error correction procedures, it has been possible to characterize real thin-film fluoride optical coatings that are inhomogeneous. The refractive index and its dispersion with wavelengths greater than 300–700 nm as well as the depth profile of voids in the film have been determined for AlF3, CeF3, HfF4, LaF3, ScF3, and YF3 films on vitreous silica substrates.

© 1994 Optical Society of America

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