Abstract

Fabrication of very-narrow-bandpass optical tunable filters [(0.3 nm full width at half-maximum) (FWHM)] is reported. To improve the film densities, the O₂ ion-assisted deposition-method is used in the fabrication. In the succession of high- and low-refractive-index layers, the commonly used TiO₂ material is replaced The relative thicknesses of the by Ta₂O₅, which suits the ion-assisted fabrication technique. filter multilayer structure of 1/2/1 are modified to 0.998/2.007/0.998, which reduces the shift difference in the central wavelengths with regard to the p and s polarizations when the filter is tilted. These improvements enabled fabrication of 0.3-nm-FWHM optical tunable filters with improved stability characteristics.

© 1994 Optical Society of America

Thermally stable narrow-bandpass filter prepared by reactive ion-assisted sputtering

Rung-Ywan Tsai, Chia Shy Chang, Cheng Wei Chu, Tzushin Chen, Fred Dai, Doris Lin, ShaoFeng Yan, and Albert Chang
Appl. Opt. 40(10) 1593-1598 (2001)

Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition

Haruo Takashashi
Appl. Opt. 34(4) 667-675 (1995)

Optical coatings deposited by reactive ion plating

Allan J. Waldorf, J. A. Dobrowolski, Brian T. Sullivan, and L. M. Plante
Appl. Opt. 32(28) 5583-5593 (1993)

Temperature-stable bandpass filters deposited with plasma ion-assisted deposition

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing
Appl. Opt. 35(28) 5609-5612 (1996)

Mechanical characteristics of optical coatings prepared by various techniques: a comparative study

Jolanta E. Klemberg-Sapieha, Jörg Oberste-Berghaus, Ludvik Martinu, Richard Blacker, Ian Stevenson, George Sadkhin, Dale Morton, Scott McEldowney, Robert Klinger, Phil J. Martin, Nadia Court, Svetlana Dligatch, Mark Gross, and Roger P. Netterfield
Appl. Opt. 43(13) 2670-2679 (2004)