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Interferometric fabrication of modulated submicrometer gratings in photoresist

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Abstract

Interferometric recording is applied to the fabrication of modulated submicrometer gratings in photoresist.

High diffraction efficiency requires optimized recording conditions, which are obtained by the use of an on-axis continuous surface-relief grating for the generation of the object beam. The optimized phase function is copied into the resist layer by means of a self-aligned two-step recording process with an intermediate copy in a volume photopolymer hologram. As a result, we demonstrate high carrier frequency surface-relief off-axis fan-out gratings for illumination in transmission with visible light.

© 1995 Optical Society of America

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