Abstract

Interferometric recording is applied to the fabrication of modulated submicrometer gratings in photoresist.

High diffraction efficiency requires optimized recording conditions, which are obtained by the use of an on-axis continuous surface-relief grating for the generation of the object beam. The optimized phase function is copied into the resist layer by means of a self-aligned two-step recording process with an intermediate copy in a volume photopolymer hologram. As a result, we demonstrate high carrier frequency surface-relief off-axis fan-out gratings for illumination in transmission with visible light.

© 1995 Optical Society of America

Fan-out elements recorded as volume holograms: optimized recording conditions

H. P. Herzig, P. Ehbets, D. Prongué, and R. Dändliker
Appl. Opt. 31(26) 5716-5723 (1992)

Optimized kinoform structures for highly efficient fan-out elements

D. Prongué, H. P. Herzig, R. Dändliker, and M. T. Gale
Appl. Opt. 31(26) 5706-5711 (1992)

Dynamic holographic gratings with photoresist

A. Olivares-Pérez, L. R. Berriel-Valdos, J. L. Juárez-Pérez, and F. Mendoza Santoyo
Appl. Opt. 34(25) 5577-5581 (1995)

High-efficiency binary fan-out gratings by modulation of a high-frequency carrier grating

P. Blair, M. R. Taghizadeh, W. Parkes, and C. D. W. Wilkinson
Appl. Opt. 34(14) 2406-2413 (1995)

Continuous-relief diffractive optical elements for two-dimensional array generation

Michael T. Gale, Markus Rossi, Helmut Schütz, Peter Ehbets, Hans Peter Herzig, and Damien Prongué
Appl. Opt. 32(14) 2526-2533 (1993)