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Flexible mirror micromachined in silicon

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Abstract

An electrostatically controlled flexible mirror has been fabricated on a silicon chip by means of bulk micromachining. The mirror has a 10.5 mm × 10.5 mm square aperture and consists of a 0.5-μm-thick tensile-stressed silicon-nitride diaphragm coated with a 0.2-μm-thick reflective aluminum layer. The reflecting surface is initially plane with a mean-square deviation of ∼λ/8 for λ = 633 nm. The shape of the reflecting surface is controlled electrostatically by an array of integrated actuators. Good initial optical quality and the possibility of electrostatic control of the reflecting surface make the on-chip mirror useful for various electro-optical applications.

© 1995 Optical Society of America

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