Abstract

A convenient method is described for optical characterization of thin films during growth. The method has been demonstrated on lead zirconate titanate (PZT) films deposited by pulsed laser ablation for various temperatures. The optical constants of the PZT films as well as the film growth rate were determined in situ by fitting (with three free parameters) the calculated reflectance as a function of film thickness to the experimental reflectance curve as a function of deposition time, as obtained by unpolarized laser reflectometry. The fitted parameters are the uniform complex PZT refractive index and the layer thickness (assumed proportional to time), with the complex refractive index of the platinum substrate being measured previously. These results compare well with the subsequent ellipsometric measurements made to assess the precision of the reflectometry technique.

© 1997 Optical Society of America

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