Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics

Not Accessible

Your library or personal account may give you access

Abstract

A multilayer coating alters the amplitude and phase of a reflected wave front. The amplitude effects are multiplicative and well understood. We present a mathematical formalism that can be used to describe the phase effects of coating in a general case. On the basis of this formalism we have developed an analytical method of estimating the wave-front aberrations introduced by the multilayer coating. For the case of field-independent aberrations, we studied both uniform and graded multilayer coatings. For the case of field-dependent aberrations, we studied only the effects of a uniform multilayer coating. Our analysis is based on a coated plane mirror tilted with respect to an incident converging beam. Altogether we have found, up to the second order, the following aberrations: a field-dependent piston, a field-squared-dependent piston, defocus, field-independent tilt, field-independent astigmatism, and anamorphic magnification. To obtain numerical results we apply our analysis to the specific case of a plane mirror tilted 8.2 deg with respect to an incident converging beam with a numerical aperture of 0.1. We find that the magnitudes of the field-independent aberration coefficients for the graded coating are approximately ten times smaller than those for the uniform coating. We show that a coating can introduce anamorphic magnification.

© 2001 Optical Society of America

Full Article  |  PDF Article
More Like This
Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta
Appl. Opt. 41(16) 3262-3269 (2002)

Recovery of multilayer-coated Zerodur and ULE optics for extreme-ultraviolet lithography by recoating, reactive-ion etching, and wet-chemical processes

Paul B. Mirkarimi, Sherry L. Baker, Claude Montcalm, and James A. Folta
Appl. Opt. 40(1) 62-70 (2001)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (9)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (15)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Metrics

Select as filters


Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved