Abstract

We report on a novel imaging ellipsometer using a high-numerical-aperture (NA) objective lens capable of measuring a two-dimensional ellipsometric signal with high resolution. Two-dimensional ellipsometric imaging is made possible by spatial filtering at the pupil plane of the objective. A Richards-Wolf vectorial diffraction model and geometrical optics model are developed to simulate the system. The thickness profile of patterned polymethyl methacrylate is measured for calibration purposes. Our instrument has a sensitivity of 5 Å and provides spatial resolution of approximately 0.5 µm with 632.8-nm illumination. Its capability of measuring refractive-index variations with high spatial resolution is also demonstrated.

© 2002 Optical Society of America

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