Abstract

A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles γ_x and γ_y of the target’s scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.

© 2002 Optical Society of America

Microellipsometer with radial symmetry

Qiwen Zhan and James R. Leger
Appl. Opt. 41(22) 4630-4637 (2002)

High-resolution imaging ellipsometer

Qiwen Zhan and James R. Leger
Appl. Opt. 41(22) 4443-4450 (2002)

Ellipsometry of rough surfaces

T. V. Vorburger and K. C. Ludema
Appl. Opt. 19(4) 561-573 (1980)

Ellipsometric analysis for surface roughness and texture

Soe-Mie F. Nee
Appl. Opt. 27(14) 2819-2831 (1988)

Roughness measurements of Si and Al by variable angle spectroscopic ellipsometry

Julio R. Blanco and Patrick J. McMarr
Appl. Opt. 30(22) 3210-3220 (1991)