Nonlinear optical absorption of ZnO doped with copper nanoparticles in the picosecond and nanosecond pulse laser field

Aleksandr Ryasnyansky; Bruno Palpant; Solange Debrus; Rashid Ganeev; Andrey Stepanov; Nurdogan Can; Christoph Buchal; Sibel Uysal

doi:10.1364/AO.44.002839

Applied Optics
Vol. 44,
Issue 14,
pp. 2839-2845
(2005)
•https://doi.org/10.1364/AO.44.002839

Nonlinear optical absorption of ZnO doped with copper nanoparticles in the picosecond and nanosecond pulse laser field

Aleksandr Ryasnyansky, Bruno Palpant, Solange Debrus, Rashid Ganeev, Andrey Stepanov, Nurdogan Can, Christoph Buchal, and Sibel Uysal

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Aleksandr Ryasnyansky, Bruno Palpant, Solange Debrus, Rashid Ganeev, Andrey Stepanov, Nurdogan Can, Christoph Buchal, and Sibel Uysal, "Nonlinear optical absorption of ZnO doped with copper nanoparticles in the picosecond and nanosecond pulse laser field," Appl. Opt. 44, 2839-2845 (2005)

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Abstract

The nonlinear absorption of nanocomposite layers based on ZnO implanted with Cu⁺ ions with an energy of 160 keV in implantation doses of 10¹⁶ and 10¹⁷ ions/cm² was investigated. The values of the nonlinear absorption coefficient were measured by the Z-scan method at a wavelength of 532 nm by use of nanosecond and picosecond laser pulses. Possible optical applications of these materials are discussed.

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Matrix	SPR λ (nm)	Preparxation Method	Laser Characteristics	β (cm W⁻¹)	Reference
Sample 1	600	Ion implantation	Nd:YAG laser, τ = 7.5 ns, λ = 532 nm	6.73 × 10⁻⁴	Present data
Sample 2	600			5.46 × 10⁻³
Sample 1	600		Nd:YAG laser, τ = 55 ps, λ = 532 nm	3.54 × 10⁻⁴
Sample 2	600			2.07 × 10⁻³
SG	565	Ion implantation	Dye laser, τ = 6 ps, λ = 570–600 nm	0.1–1 × 10⁻⁶	20
Al₂O₃	590	Pulsed-laser deposition	Dye laser, τ = 6 ps, λ = 596 nm	−0.75–0.5 × 10⁻⁴	21
SG	553	rf-magnetron sputtering with thermal annealing	Nd:phosphate glass, τ = 6 ps, λ = 527 nm	4 × 10⁻⁷	22
Ethoxyethanol	570–590	Chemical	Nd:YAG, τ = 7 ns, λ = 532 nm	−(6–15) × 10⁻⁸	23
SG	580	Multitarget sputtering	OPA^a pumped by Ti:sapphire, τ = 150 fs, λ = 590 nm	∼2 × 10⁻⁹	24
SG	560	rf-magnetron sputtering with thermal annealing	Nd:glass, τ = 6 ps, λ = 527 nm	1.7 × 10⁻¹⁰	25
Al₂O₃	590	Pulsed-laser deposition	Dye laser, τ = 6 ps, λ = 596 nm	−2.34 × 10⁻⁵	26
Al₂O₃	600	Pulsed-laser deposition	Frequency-doubled OPA-800C,^a τ = 7 ps, λ = 600 nm	4 × 10⁻⁵	27

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Applied Optics