Holography in commercially available photoetchable glasses

Michael Kösters; Hung-Te Hsieh; Demetri Psaltis; Karsten Buse

doi:10.1364/AO.44.003399

Applied Optics
Vol. 44,
Issue 17,
pp. 3399-3402
(2005)
•https://doi.org/10.1364/AO.44.003399

Holography in commercially available photoetchable glasses

Michael Kösters, Hung-Te Hsieh, Demetri Psaltis, and Karsten Buse

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Michael Kösters, Hung-Te Hsieh, Demetri Psaltis, and Karsten Buse, "Holography in commercially available photoetchable glasses," Appl. Opt. 44, 3399-3402 (2005)

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Abstract

Volume holographic gratings are recorded and retrieved in two commercially available glasses: Schott Foturan and Hoya PEG3. These materials are photoetchable, which describes their major application, but they also allow storage of volume holograms without any chemical etching. The samples are illuminated with ultraviolet light at a wavelength of 325 nm and thermally processed to achieve a maximum diffraction efficiency of ≈9% for a 1-mm-thick sample. The two glasses show similar behavior; the diffraction efficiencies in Foturan tend to be slightly larger, whereas PEG3 tends to have weaker light scattering.

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Compound	Symbol	Foturan (%)	PEG3 (%)
Silica	SiO₂	75–85	78
Lithium oxide	Li₂O	7–11	10
Aluminum oxide	Al₂O₃	3–6	6
Potassium oxide	K₂O	3–6	4
Sodium oxide	Na₂O	1–2	1
Zinc oxide	ZnO	0–2	1
Antimony oxide	Sb₂O₃	0.2–0.4	—
Silver oxide	Ag₂O	0.05–0.15	0.08
Cerium oxide	CeO₂	0.01–0.04	0.08
Gold oxide	AuO	—	0.003

Glass Type	Exposure	Annealing Conditions	Results

			633 nm	785 nm	840 nm
			α	α	α
			η	η	η
			d	d	d
Foturan	10 J/cm²	(a) 3.2 °C/min to 500 °C	0.73 mm⁻¹	0.27 mm⁻¹	0.27 mm⁻¹
		(b) 120 min at 500 °C	0.6%	0.25%	0.21%
		(c) 1.3 °C/min to 590 °C	0.63 mm	0.61 mm	0.44 mm
		(d) —
		(e) ≈ 4 °C/min
	15 J/cm²	(a) 3.5 °C/min	4.31 mm⁻¹	2.24 mm⁻¹	1.87 mm⁻¹
		(b) 120 min	9.4%	3.9%	6.3%
		(c) 1.3 °C/min	0.61 mm	0.59 mm	0.68 mm
		(d) —
		(e) ≈4 °C/min
PEG3	10 J/cm²	(a) 3.5 °C/min to 490 °C	0.24 mm⁻¹	0.11 mm⁻¹	0.07 mm⁻¹
		(b) 90 min at 490 °C	0.55%	0.36%	0.13%
		(c) 2.0 °C/min to 580 °C	1.32 mm	1.69 mm	0.55 mm
		(d) —
		(e) ≈ 4 °C/min

Compound	Symbol	Foturan (%)	PEG3 (%)
Silica	SiO₂	75–85	78
Lithium oxide	Li₂O	7–11	10
Aluminum oxide	Al₂O₃	3–6	6
Potassium oxide	K₂O	3–6	4
Sodium oxide	Na₂O	1–2	1
Zinc oxide	ZnO	0–2	1
Antimony oxide	Sb₂O₃	0.2–0.4	—
Silver oxide	Ag₂O	0.05–0.15	0.08
Cerium oxide	CeO₂	0.01–0.04	0.08
Gold oxide	AuO	—	0.003

Glass Type	Exposure	Annealing Conditions	Results

			633 nm	785 nm	840 nm
			α	α	α
			η	η	η
			d	d	d
Foturan	10 J/cm²	(a) 3.2 °C/min to 500 °C	0.73 mm⁻¹	0.27 mm⁻¹	0.27 mm⁻¹
		(b) 120 min at 500 °C	0.6%	0.25%	0.21%
		(c) 1.3 °C/min to 590 °C	0.63 mm	0.61 mm	0.44 mm
		(d) —
		(e) ≈ 4 °C/min
	15 J/cm²	(a) 3.5 °C/min	4.31 mm⁻¹	2.24 mm⁻¹	1.87 mm⁻¹
		(b) 120 min	9.4%	3.9%	6.3%
		(c) 1.3 °C/min	0.61 mm	0.59 mm	0.68 mm
		(d) —
		(e) ≈4 °C/min
PEG3	10 J/cm²	(a) 3.5 °C/min to 490 °C	0.24 mm⁻¹	0.11 mm⁻¹	0.07 mm⁻¹
		(b) 90 min at 490 °C	0.55%	0.36%	0.13%
		(c) 2.0 °C/min to 580 °C	1.32 mm	1.69 mm	0.55 mm
		(d) —
		(e) ≈ 4 °C/min

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