Abstract

The development of an optical setup that permits us to carry out high-resolution mappings of the absolute optical thickness of plane-parallel transparent windows is described. This measurement is based on the recording and processing of the spectral transmission of the wafer between 1520 and 1570 nm and has a relative precision better than 10⁻⁶. Hence it is used for the characterization of the photosensitivity of two organic photopolymers (cationic ring opening polymer and poly(methylmethacrylate)). The refractive index change dynamics for both materials and the spontaneous evolution of the optical thickness are demonstrated.

© 2006 Optical Society of America

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