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Characterization of high refractive index semiconductor films by surface plasmon resonance

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Abstract

Si-based surface plasmon resonance (SPR) in the Kretschmann–Raether geometry is considered as a platform for the optical measurement of high refractive index films. The implementation of the SPR effect becomes possible due to the relatively high index of refraction of Si compared to most materials. As examples we study the SPR responses for some important semiconductor-based films, including laser-ablated porous silicon and thin germanium films. Using SPR data, we determine the refractive indices of these films for different parameters (thickness and porosity) and ambiences. We also discuss novel SPR biosensor architectures with the use of these solid films.

© 2006 Optical Society of America

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