Abstract

Computer simulations of nanofocusing by elliptical mirrors are presented wherein the diffraction and propagation of coherent hard x rays are predicted using wave-optical calculations. Surface height data acquired via microstitching interferometry were used to calculate the complex pupil function of a mirror, taking into account the Fresnel reflectivity and treating the surface topography as an aberration to a perfect elliptical mirror. The reflected wave-field amplitude and phase downstream of the mirror were obtained by numerically evaluating the Fresnel–Kirchhoff diffraction integral. Simulated intensity profiles and contours (isophotes) around the focal plane are presented for coherent illumination by a $15\text{\hspace{0.17em} keV}$ point source, which indicate nearly diffraction-limited focusing at the $40\text{\hspace{0.17em} nm}$ level. The effect of high spatial frequency microroughness on nanofocusing was investigated by low-pass filtering the Fourier spectrum of the residual height profile. Simulations using the filtered metrology data confirmed that roughness length scales shorter than $0.1\text{\hspace{0.17em} mm}$ have a minor effect on the focal spot size and intensity.

© 2007 Optical Society of America

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