Abstract
thin films of different thicknesses were deposited on (111) and silicon substrates at a relatively low substrate temperature of . Optical (transmittance, reflectance, refractive index, and extinction coefficient) and mechanical (morphology and crystalline structure) properties have been investigated and are discussed. It is shown that thin films deposited on (111) substrates are monocrystalline and have a bulklike dense structure. Furthermore, it is presented that low-loss thin films can be deposited not only by boat evaporation but also by electron beam evaporation.
© 2007 Optical Society of America
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