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Fluoride antireflection coatings deposited at 193 nm

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Abstract

Antireflection coatings for 193 nm composed of low-index (MgF2 and AlF3) and high-index (LaF3 and GdF3) materials are deposited by the resistive heating boat method at a substrate temperature of 300 °C. The optical characteristics (reflectance and optical loss), microstructure (morphology and surface roughness), stress, and laser-induced damage threshold (LIDT) of the coatings are investigated and discussed. The related reflection at 193 nm of the four kinds of antireflection coatings is smaller than 0.2% and the optical loss is less than 0.15%. Of the fluoride antireflection coatings, AlF3GdF3 had the lowest stress value. Antireflection coatings with AlF3 as the low-index material had higher LIDT values than whenMgF2 was used.

© 2008 Optical Society of America

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