Directly photoinscribed refractive index change and Bragg gratings in Ohara WMS-15 glass ceramic

Peter A. Krug; Rodica Matei Rogojan; Jacques Albert

doi:10.1364/AO.48.003429

Applied Optics
Vol. 48,
Issue 18,
pp. 3429-3437
(2009)
•https://doi.org/10.1364/AO.48.003429

Directly photoinscribed refractive index change and Bragg gratings in Ohara WMS-15 glass ceramic

Peter A. Krug, Rodica Matei Rogojan, and Jacques Albert

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Peter A. Krug, Rodica Matei Rogojan, and Jacques Albert, "Directly photoinscribed refractive index change and Bragg gratings in Ohara WMS-15 glass ceramic," Appl. Opt. 48, 3429-3437 (2009)

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Abstract

We inscribed thick volume gratings in WMS-15 glass ceramic by ultraviolet light at 193 and $248 nm$ . Unlike earlier work in ceramic materials, the inscription process modified the optical properties of the material without the need for any additional chemical or thermal processing. Experimental evidence from measurements of grating growth, thermal annealing, and spectral absorption indicates that two distinct physical mechanisms are responsible for the grating formation. Weak, easily thermally bleached gratings resulted from exposure fluences below $0.3 kJ / {cm}^{2}$ . Optical absorption measurements suggest that these low fluence gratings are predominantly absorption gratings. More thermally stable gratings, found to be refractive index gratings with unsaturated refractive index modulation amplitude as large as $6 \times 10^{- 5}$ were formed at cumulative fluences of $1 kJ / {cm}^{2}$ and above.

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Chemical Species	Percentage by Weight
${SiO}_{2}$	$70 - 80$
${Al}_{2} O_{3}$	$2 - 10$
${ZrO}_{2}$	$2 - 10$
$P_{2} O_{5}$	$2 - 10$
$ZnO$	$0 - 2$
${Sb}_{2} O_{3}$	$0 - 2$

Annealing Stage	Annealing Temperature ( $° C$ )	Annealing Duration (h)
0	20	—
1	100	5
2	100	86
3	200	18
4	300	18
5	400	$19 ½$
6	500	$21 ¾$

UV Exposure Dose ( $kJ / {cm}^{2}$ )	$1 / e$ Intensity Absorption Depth (μm)	Grating Thickness (μm)	Grating Modulation
0	299	—
0.03	264	160	Absorption loss
30	245	127	Refractive index

Parameter	Low-UV Dose	High-UV Dose
Energy dose range ( $kJ / {cm}^{2}$ )	$< 1$	$\geq 1$
Dose for maximum grating strength ( $kJ / {cm}^{2}$ )	$\sim 0.3$	$> 30$
Grating mechanism	Absorption loss modulation	Refractive index modulation
Grating growth rate	Rapid up to maximum, then negative	Slow increase
Grating thickness (μm)	$160 \pm 20$	$127 \pm 20$
Effect of annealing	Decrease in strength	Increase in strength up to ~ $200 ° C$ , then decrease
Temperature for 50% erasure of index or absorbance modulation ( $° C$ )	$\sim 100$	$\sim 300$
Change in visible wavelength absorbance with UV dose	Peaks at about $1 kJ / {cm}^{2}$ , then decreases for higher exposure	Increases very slowly with exposure
Change in visible wavelength absorbance with annealing at $200 ° C$	Bleaches rapidly	Little change
Change in UV wavelength absorbance with UV dose	Increases slowly with exposure	Increases very slowly with exposure
Change in UV wavelength absorbance with annealing at $200 ° C$	Decreases slowly with exposure	Little change

Chemical Species	Percentage by Weight
${SiO}_{2}$	$70 - 80$
${Al}_{2} O_{3}$	$2 - 10$
${ZrO}_{2}$	$2 - 10$
$P_{2} O_{5}$	$2 - 10$
$ZnO$	$0 - 2$
${Sb}_{2} O_{3}$	$0 - 2$

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Applied Optics