Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings

Adriana Szeghalmi; Michael Helgert; Robert Brunner; Frank Heyroth; Ulrich Gösele; Mato Knez

doi:10.1364/AO.48.001727

Applied Optics
Vol. 48,
Issue 9,
pp. 1727-1732
(2009)
•https://doi.org/10.1364/AO.48.001727

Atomic layer deposition of ${Al}_{2} O_{3}$ and ${TiO}_{2}$ multilayers for applications as bandpass filters and antireflection coatings

Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez

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Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez, "Atomic layer deposition of Al₂O₃ and TiO₂ multilayers for applications as bandpass filters and antireflection coatings," Appl. Opt. 48, 1727-1732 (2009)

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Related Topics
Table of Contents Category
- Thin Films
Optics & Photonics Topics
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The topics in this list come from the Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Thin films (310.0310)
- Antireflection coatings (310.1210)
- Interference coatings (310.1620)
- Deposition and fabrication (310.1860)
- Multilayer design (310.4165)

About this Article
History
- Original Manuscript: January 6, 2009
- Revised Manuscript: March 3, 2009
- Manuscript Accepted: March 3, 2009
- Published: March 13, 2009

Abstract

${Al}_{2} O_{3}$ and ${TiO}_{2}$ thin films have been deposited on Si wafers, quartz, BK7 glass, and polycarbonate substrates by atomic layer deposition (ALD). The refractive indices and growth rates of the materials have been determined by spectroscopic ellipsometry and transmission electron microscopy. The influence of substrate temperature and precursor on the refractive indices has been investigated. The refractive index of ${TiO}_{2}$ significantly increases with temperature, whereas the ${Al}_{2} O_{3}$ films are temperature insensitive. The films deposited using $H_{2} O_{2}$ as oxygen source show a slightly higher refractive index than the films prepared with $H_{2} O$ . Multilayer narrow-bandpass filters and broadband antireflective coatings have been designed and produced by ALD.

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		Sample 1	Sample 2	Sample 3	Sample 4	Sample 5
Peak Position (nm)		470	469	473	477	485
Substrate		$1.2 mm$
Layer	PC	Thickness (nm)
1	${TiO}_{2}$	41.9	43.5	39.9	45.2	43.4
2	${Al}_{2} O_{3}$	68.1	63.7	66.6	69.6	61.2
3	${TiO}_{2}$	47.2	45.3	46.2	45.7	45.4
4	${Al}_{2} O_{3}$	72.3	69.2	70.4	74.4	67.7
5	${TiO}_{2}$	50.5	46.0	47.3	48.7	43.1
6	${Al}_{2} O_{3}$	78.1	74.8	77.2	78.2	75.2
7	${TiO}_{2}$	54.6	55.5	59.9	52.0	53.6
8 ( $2 L$ )	${Al}_{2} O_{3}$	125.1	130.5	136.1	148.8	149.2
9	${TiO}_{2}$	58.1	53.8	49.9	52.5	49.2
10	${Al}_{2} O_{3}$	77.5	79.5	77.5	78.0	77.0
11	${TiO}_{2}$	50.7	54.1	52.0	49.7	54.8
12	${Al}_{2} O_{3}$	78.0	76.2	75.1	78.1	75.9
13	${TiO}_{2}$	51.9	47.9	45.3	51.3	41.7
14	${Al}_{2} O_{3}$	81.0	80.1	76.8	79.3	75.5
15	${TiO}_{2}$	57.4	60.6	61.9	55.8	62.6

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