General method of sensitivity control for manufacturing errors

Akira Yabe

doi:10.1364/AO.49.005175

Applied Optics
Vol. 49,
Issue 27,
pp. 5175-5182
(2010)
•https://doi.org/10.1364/AO.49.005175

General method of sensitivity control for manufacturing errors

Akira Yabe

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Akira Yabe, "General method of sensitivity control for manufacturing errors," Appl. Opt. 49, 5175-5182 (2010)

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Abstract

In this paper, the sensitivity control for manufacturing errors is treated from three aspects. A wavefront-based sensitivity function is proposed, the effect of which is verified with the modulation transfer function (MTF)-based Monte Carlo simulation. Then, the direct optimization of the MTF-based Monte Carlo simulation result is proposed. Finally, the effect of the sensitivity control function to get better lens types is shown.

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Element number	8
Aspherical element number	2
Maximum lens length	$130 mm$
Maximum lens diameter	$60 mm$
Source diagonal	$22 mm$
Screen distance	$1125 mm$ and $2250 mm$
Screen diagonal	$2400 mm$ and $4800 mm$
F-number	2.4
Sample wavelenghts	$540 nm$ , $450 nm$ , $630 nm$
$MTF > 60 %$ at	$36 lp / mm$
Sample ray number per field per wavelength	16
Total number of solutions	33
Decenter tolerance	$20 μm$
Curvature error tolerance	10 fringes

Element number	4
Aspherical element number	4
Maximum lens length	$200 mm$
Source diagonal	$100 mm$
Focal length	$100 mm$
F-number	1.0
Wavelength	$546.1 nm$
$MTF > 90 %$ at	$6 lp / mm$
Sample ray number per field	40
Total number of solutions	19
Decenter tolerance	$20 μm$

Element number	4
Aspherical element number	4
Total track length	$5.33 mm$
Image height	$2.856 mm$
Field of view	$70 \deg$
F-number	2.4
Green channel $MTF > 50 %$ at	$180 lp / mm$
Sample rays per field per wavelength	40
Decenter tolerance	$5 μ m$

Element number	8
Aspherical element number	2
Maximum lens length	$130 mm$
Maximum lens diameter	$60 mm$
Source diagonal	$22 mm$
Screen distance	$1125 mm$ and $2250 mm$
Screen diagonal	$2400 mm$ and $4800 mm$
F-number	2.4
Sample wavelenghts	$540 nm$ , $450 nm$ , $630 nm$
$MTF > 60 %$ at	$36 lp / mm$
Sample ray number per field per wavelength	16
Total number of solutions	33
Decenter tolerance	$20 μm$
Curvature error tolerance	10 fringes

Element number	4
Aspherical element number	4
Maximum lens length	$200 mm$
Source diagonal	$100 mm$
Focal length	$100 mm$
F-number	1.0
Wavelength	$546.1 nm$
$MTF > 90 %$ at	$6 lp / mm$
Sample ray number per field	40
Total number of solutions	19
Decenter tolerance	$20 μm$

Abstract

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Tables (3)

Equations (19)

Applied Optics