Abstract
A polarizer–sample–Wollaston prism analyzer ellipsometer is described in which the ellipsometric angles ψ and Δ are determined by direct measurement of the elliptically polarized light reflected from the sample. With the Wollaston prism initially set to transmit p- and s-polarized light, the azimuthal angle P of the polarizer is adjusted until the two beams have equal intensity. This condition yields and ensures that the reflected elliptically polarized light has an azimuthal angle of and maximum ellipticity. Rotating the Wollaston prism through and adjusting the analyzer azimuth until the two beams again have equal intensity yields the ellipticity that allows Δ to be determined via a simple linear relationship. The errors produced by nonideal components are analyzed. We show that the polarizer dominates these errors but that for most practical purposes, the error in ψ is negligible and the error in Δ may be corrected exactly. A native oxide layer on a silicon substrate was measured at a single wavelength and multiple angles of incidence and spectroscopically at a single angle of incidence. The best fit film thicknesses obtained were in excellent agreement with those determined using a traditional null ellipsometer.
© 2011 Optical Society of America
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