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Double-exposure phase calculation method in electronic speckle pattern interferometry based on holographic object illumination

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Abstract

Multiple-exposure phase calculation procedures are widely used in electronic speckle pattern inter ferometry to calculate phase maps of displacements. We developed a double-exposure process based on holographic illumination of the object and the idea of the spatial carrier phase-shifting method to examine transient displacements. In our work, computer-generated holograms and a spatial light modulator were used to generate proper coherent illuminating masks. In this adjustment all phase-shifted states were at our disposal from one recorded speckle image for phase calculation. This technique can be used in the large scale of transient measurements. In this paper we illustrate the principle through several examples.

© 2011 Optical Society of America

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