Abstract

In the present study we determine the optical parameters of thin metal–dielectric films using two different characterization techniques based on nonparametric and multiple oscillator models. We consider four series of thin metal–dielectric films produced under various deposition conditions with different optical properties. We compare characterization results obtained by nonparametric and multiple oscillator techniques and demonstrate that the results are consistent. The consistency of the results proves their reliability.

© 2011 Optical Society of America

General approach to reliable characterization of thin metal films

Tatiana V. Amotchkina, Vesna Janicki, Jordi Sancho-Parramon, Alexander V. Tikhonravov, Michael K. Trubetskov, and Hrvoje Zorc
Appl. Opt. 50(10) 1453-1464 (2011)

Thin film characterization for modeling and optimization of silver-dielectric color filters

Laurent Frey, Pascale Parrein, Léopold Virot, Catherine Pellé, and Jacques Raby
Appl. Opt. 53(8) 1663-1673 (2014)

Spectral polarimetry technique as a complementary tool to ellipsometry of dielectric films

Marcelo B. Pereira, Bruno J. Barreto, and Flavio Horowitz
Appl. Opt. 50(9) C420-C423 (2011)

Fiber-optic surface-plasmon resonance for the determination of thickness and optical constants of thin metal films

Wen Bin Lin, Jean Marc Chovelon, and Nicole Jaffrezic-Renault
Appl. Opt. 39(19) 3261-3265 (2000)

Use of gold island films in design of reflectors with high luminosity

Hrvoje Zorc, Martin Lončarić, and Jordi Sancho-Parramon
Appl. Opt. 50(9) C364-C367 (2011)