Optical Interference Coatings 2010 Measurement Problem

Angela Duparré; Detlev Ristau

doi:10.1364/AO.50.00C172

Applied Optics
Vol. 50,
Issue 9,
pp. C172-C177
(2011)
•https://doi.org/10.1364/AO.50.00C172

Optical Interference Coatings 2010 Measurement Problem

Angela Duparré and Detlev Ristau

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Angela Duparré and Detlev Ristau, "Optical Interference Coatings 2010 Measurement Problem," Appl. Opt. 50, C172-C177 (2011)

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Abstract

The 2010 Measurement Problem comprised the determination of the reflectance of high-reflective dielectric mirrors at $1064 nm$ .

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Sample Type	Loss (ppm)	Dev. (ppm)	R (%)
A	39.9	2.4	99.996
B	1216.5	73.9	99.878

Institution	Contact
Aerospace Cooperation, Los Angeles, California, USA	James D. Barrie
Chinese Academy of Sciences, Shanghai, China	Hongbo He
Chinese Academy of Sciences, Chengdu, China	Bincheng Li
Escuela Universitaria de Optica, Madrid, Spain	Juan Carlos Martinez Anton
Fraunhofer FEP, Dresden, Germany	Kerstin Täschner
Fraunhofer IST, Braunschweig, Germany	Michael Vergöhl
Institut f. Photonische Technologien, Jena, Germany	Christian Mühlig
JDSU, Santa Rosa, California, USA	Cliff Alapa
Laser Zentrum Hannover, Germany	Detlev Ristau
MLD Technologies, Eugene, Oregon, USA	Sven Nelte
National Research Council, Ottawa, Canada	Daniel Poitras
Perkin Elmer, Rodgau-Jüdesheim, Germany	Ivo Stemmler
OMT Solutions, Eindhoven, The Netherlands	Ivo Schoofs
RAFAEL, Haifa, Israel	Shay Joseph
Raytheon Space & Airborne Systems, El Segundo, California, USA	Robert F. Cartland
University of the West of Scotland, Paisley, UK	Frank Placido

Participant	Sample A		Sample B
Participant	R (%)	$Δ R$ (%)	R (%)	$Δ R$ (%)
1	99.76	—	99.61	—
2	99.82	0.08	99.6	0.08
3	99.7	0.2	99.6	0.2
4	99.775	—	99.496	—
5	99.988	—	99.835	—
8	—	—	99.85	—
10	99.995	0.00095	99.857	0.045
14	99.9869	—	99.7786	—
15	99.4986	0.05	99.4915	0.05
16	99.9961	0.0003	99.8849	0.0028
17	99.81	0.02	99.77	0.02
18	99.9833	0.00078	99.77	—
19	99.96	0.05	99.85	0.05
21	99.79	0.05	99.79	0.05
23	99.9964	—	99.85	—
24	99.9954	0.0002	99.851	0.003

Sample Type	Loss (ppm)	Dev. (ppm)	R (%)
A	39.9	2.4	99.996
B	1216.5	73.9	99.878

Institution	Contact
Aerospace Cooperation, Los Angeles, California, USA	James D. Barrie
Chinese Academy of Sciences, Shanghai, China	Hongbo He
Chinese Academy of Sciences, Chengdu, China	Bincheng Li
Escuela Universitaria de Optica, Madrid, Spain	Juan Carlos Martinez Anton
Fraunhofer FEP, Dresden, Germany	Kerstin Täschner
Fraunhofer IST, Braunschweig, Germany	Michael Vergöhl
Institut f. Photonische Technologien, Jena, Germany	Christian Mühlig
JDSU, Santa Rosa, California, USA	Cliff Alapa
Laser Zentrum Hannover, Germany	Detlev Ristau
MLD Technologies, Eugene, Oregon, USA	Sven Nelte
National Research Council, Ottawa, Canada	Daniel Poitras
Perkin Elmer, Rodgau-Jüdesheim, Germany	Ivo Stemmler
OMT Solutions, Eindhoven, The Netherlands	Ivo Schoofs
RAFAEL, Haifa, Israel	Shay Joseph
Raytheon Space & Airborne Systems, El Segundo, California, USA	Robert F. Cartland
University of the West of Scotland, Paisley, UK	Frank Placido

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