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Instrument for close-to-process light scatter measurements of thin film coatings and substrates

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Abstract

Scatter analysis is an effective method for the characterization of thin film components. The new highly sensitive table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance, Reflectance and Optical Scatter Measurement—Table Top) has been developed at the Fraunhofer Institute in Jena to meet the specific requirements for close-to-process applications. Extremely high sensitivity with a noise equivalent angle resolved scatter level of 2×108sr1, full three-dimensional spherical measurement capability, and an instrument size as small as 0.8m×0.8m×0.8m have been achieved. Details of specifications, optical components, and software are presented, including a comparison to our laboratory system. Anisotropy analysis of diamond-turned aluminum substrates as well as substrate and coating characterization are demonstrated as examples of application.

© 2011 Optical Society of America

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