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Design and fabrication of multichannel Si / Si O 2 autocloned photonic crystal edge filters

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Abstract

An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (13001500nm) is experimentally demonstrated.

© 2010 Optical Society of America

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