Optical parameters of oxide films typically used in optical coating production

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina; Gary DeBell; Vladimir Pervak; Anna Krasilnikova Sytchkova; Maria Luisa Grilli; Detlev Ristau

doi:10.1364/AO.50.000C75

Applied Optics
Vol. 50,
Issue 9,
pp. C75-C85
(2011)
•https://doi.org/10.1364/AO.50.000C75

Optical parameters of oxide films typically used in optical coating production

Alexander V. Tikhonravov, Michael K. Trubetskov, Tatiana V. Amotchkina, Gary DeBell, Vladimir Pervak, Anna Krasilnikova Sytchkova, Maria Luisa Grilli, and Detlev Ristau

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Alexander V. Tikhonravov, Michael K. Trubetskov, Tatiana V. Amotchkina, Gary DeBell, Vladimir Pervak, Anna Krasilnikova Sytchkova, Maria Luisa Grilli, and Detlev Ristau, "Optical parameters of oxide films typically used in optical coating production," Appl. Opt. 50, C75-C85 (2011)

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The topics in this list come from the Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Materials and process characterization (310.3840)
- Thin films, optical properties (310.6860)

About this Article
History
- Original Manuscript: July 30, 2010
- Manuscript Accepted: September 8, 2010
- Published: October 25, 2010

Abstract

Wavelength dependencies of refractive indices of thin film materials differ for various deposition conditions, and it is practically impossible to attribute a single refractive index wavelength dependence to any typical thin film material. Besides objective reasons, differences in the optical parameters of thin films may also be connected with nonadequate choices of models and algorithms used for the processing of measurement data. The main goal of this paper is to present reliable wavelength dependencies of refractive indices of the most widely used slightly absorbing oxide thin film materials. These dependencies can be used by other researchers for comparison and verification of their own characterization results.

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Film Material	Sample Number	Deposition Process	Measurement Data Spectral Region (nm)	Model	Film Thickness, nm	Degree of Inhomogeneity (%)	$n (λ)$	$n (500)$	Discrepancy Function (%)
${HfO}_{2}$	1	OIC 2004 APS technology	R, T 225–800	absorbing homogeneous	190.9	0	Fig. 14	1.966	0.29
${HfO}_{2}$	2	RF sputtering	R, T 250–1200	absorbing inhomogeneous	200.7	2.5	Fig. 14	1.984	0.27
${HfO}_{2}$	3	ion beam sputtering	R, T 300–850	absorbing homogeneous	213.1	0	Fig. 14	2.129	0.12
${Nb}_{2} O_{5}$	1	ion beam sputtering	T 400–1600	nonabsorbing inhomogeneous	161.9	3.2	Fig. 15	2.353	0.14
${Nb}_{2} O_{5}$	2	ac magnetron sputtering	Ellipsometric data at $65 °$ 400–850	nonabsorbing inhomogeneous surface overlayer	423.2	1.6	Fig. 15	2.366	2.25
${Nb}_{2} O_{5}$	3	magnetron sputtering	T 400–820	nonabsorbing homogeneous	305.4	0	Fig. 15	2.367	0.15
${Ta}_{2} O_{5}$	1	magnetron sputtering	T 400–820	nonabsorbing homogeneous	337.5	0	Fig. 16	2.164	0.07
${Ta}_{2} O_{5}$	2	ion beam sputtering	T 300–2000	nonabsorbing inhomogeneous	191.5	2.7	Fig. 16	2.137	0.35
${Ta}_{2} O_{5}$	3	RF magnetron sputtering	T 400–1200	nonabsorbing homogeneous	298.7	0	Fig. 16	2.156	0.26
${SiO}_{2}$	1	magnetron sputtering	T 400–820	nonabsorbing homogeneous	294.8	0	Fig. 17	1.471	0.02
${SiO}_{2}$	2	ion beam sputtering	R 400–1200	nonabsorbing homogeneous	538.3	0	Fig. 17	1.495	0.06
${Al}_{2} O_{3}$	1	RF sputtering	R, T 250–850	absorbing inhomogeneous	205.5	1.2	Fig. 18	1.654	0.1
${Al}_{2} O_{3}$	2	ion beam sputtering	R 300–850	nonabsorbing homogeneous	721.8	0	Fig. 18	1.675	0.05
${TiO}_{2}$	1	ion beam sputtering	R, T 400–850	absorbing homogeneous	507.3	0	Fig. 19	2.508	0.4
${TiO}_{2}$	2	electron beam evaporation	T 400–850	nonabsorbing homogeneous	176.5	0	Fig. 19	2.358	0.08

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