Abstract
In this article, we introduce a simple fabrication method for -based thin diffractive optical elements (DOEs) that uses the conventional processes widely used in the semiconductor industry. Photolithography and an inductively coupled plasma etching technique are easy and cost-effective methods for fabricating subnanometer-scale and thin DOEs with a refractive index of 1.45, based on . After fabricating DOEs, we confirmed the shape of the output light emitted from the laser diode light source and applied to a light-emitting diode (LED) module. The results represent a new approach to mass-produce DOEs and realize a high-brightness LED module.
© 2012 Optical Society of America
Full Article | PDF ArticleMore Like This
Walter Däschner, Pin Long, Robert Stein, Chuck Wu, and S. H. Lee
Appl. Opt. 36(20) 4675-4680 (1997)
Jin-Seung Sohn, Myung-Bok Lee, Wan-Chin Kim, Eun-Hyung Cho, Tae-Wan Kim, Chan-Young Yoon, No-Cheol Park, and Young-Pil Park
Appl. Opt. 44(4) 506-511 (2005)
Taisheng Wang, Weixing Yu, Dengying Zhang, Chunrong Li, Hongxin Zhang, Wenbin Xu, Zhijun Xu, Hua Liu, Qiang Sun, and Zhenwu Lu
Opt. Express 18(24) 25102-25107 (2010)