Spectroscopic ellipsometry studies on various zinc oxide films deposited by ion beam sputtering at room temperature

Jin-Cherng Hsu; Yung-Hsin Lin; Paul W. Wang; Yu-Yun Chen

doi:10.1364/AO.51.001209

Applied Optics
Vol. 51,
Issue 9,
pp. 1209-1215
(2012)
•https://doi.org/10.1364/AO.51.001209

Spectroscopic ellipsometry studies on various zinc oxide films deposited by ion beam sputtering at room temperature

Jin-Cherng Hsu, Yung-Hsin Lin, Paul W. Wang, and Yu-Yun Chen

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Jin-Cherng Hsu, Yung-Hsin Lin, Paul W. Wang, and Yu-Yun Chen, "Spectroscopic ellipsometry studies on various zinc oxide films deposited by ion beam sputtering at room temperature," Appl. Opt. 51, 1209-1215 (2012)

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Abstract

Various zinc oxide films were deposited by ion-beam sputter deposition (IBSD) under different oxygen partial pressures ( $P_{O 2}$ ) at room temperature. The as-deposited ZnO films fabricated at $P_{O 2} > 1.0 \times 10^{- 4} Torr$ had poly-crystalline structures to absorb water on the surface at ambient condition. Simultaneously, the film surfaces were covered and smoothed by the surface layers formed with the water, hydroxyl ( ${OH}^{-}$ ) groups, and ZnO materials investigated by X-ray photoelectron spectroscopy (XPS). When the compositions of the surface layers were used in a multilayer fitting model of spectroscopic ellipsometry, the actual optical refractive index of the ZnO film deposited at $P_{O 2} = 1.2 \times 10^{- 4} Torr$ was found to be about 1.9618 at $λ = 550 nm$ .

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	ZnO-10	ZnO-12	ZnO-20
	Before ion sputtering
$C_{o} (at . %)$	72. 5	78.5	75.8
$C_{Zn} (at . %)$	27.5	21.5	24.2
$C_{O} / C_{Zn}$	2.64	3.65	3.13
	After ion sputtering
$C_{o} (at . %)$	49. 6	49.3	48.8
$C_{Zn} (at . %)$	50.4	50.7	51.2
$C_{O} / C_{Zn}$	0.98	0.97	0.95

Sample	Ion sputtering	Total area (a.u.)	Subpeaks	Subarea (a.u.)	at.%
ZnO-10	Before	8189	ZnO	3490	42.6
			$Zn {(OH)}_{2}$	3152	38.5
			$H_{2} O$	1547	18.9
		13,277	ZnO	12,011	90.5
		13,277	$Zn {(OH)}_{2}$	1266	9.5
ZnO-12	Before	5867	ZnO	1875	32.0
			$Zn {(OH)}_{2}$	2370	40.4
			$H_{2} O$	1623	27.6
	After	13,397	ZnO	12,281	91.7
	After	13,397	$Zn {(OH)}_{2}$	1116	8.3
ZnO-20	Before	6374	ZnO	2242	35.2
			$Zn {(OH)}_{2}$	2917	45.8
			$H_{2} O$	1214	19.0
	After	13,277	ZnO	12,011	92.9
	After	13,277	$Zn {(OH)}_{2}$	1266	7.1

	ZnO-10	ZnO-12	ZnO-20
FWHM (°)	0.505	0.476	0.493
Height (a.u.)	350	749	583
Angle (°)	34.041	34.172	34.078
Grain size (nm)	$16.5 \pm 0.2$	$17.5 \pm 0.2$	$16.9 \pm 0.2$

Sample	ZnO-10		ZnO-12		ZnO-20
Model	single-layer	multilayer	single-layer	multilayer	single-layer	multilayer
MSE	5.87	4.93	6.76	3.97	7.1	3.5
$n_{ZnO}$ (at $λ = 550 nm$ )	1.9559	1.9737	2.0116	1.9618	2.0276	1.9719
$δ n$	$- 0.0178$		0.0498		0.0557
${Thickness}_{ZnO} (nm)$	86.6	73.1	121.2	114.1	115.6	105.5
$n_{EMA}$ (at $λ = 550 nm$ )	-	1.7571	-	1.6852	-	1.7195
${Thickness}_{EMA} (nm)$	-	16.2	-	12.4	-	16.8
${Roughness}_{Rms} (nm)$	-	2.12	-	1.59	-	1.11
$γ (nm)$	362.6		369.0		373.5

	ZnO-10	ZnO-12	ZnO-20
	Before ion sputtering
$C_{o} (at . %)$	72. 5	78.5	75.8
$C_{Zn} (at . %)$	27.5	21.5	24.2
$C_{O} / C_{Zn}$	2.64	3.65	3.13
	After ion sputtering
$C_{o} (at . %)$	49. 6	49.3	48.8
$C_{Zn} (at . %)$	50.4	50.7	51.2
$C_{O} / C_{Zn}$	0.98	0.97	0.95

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Applied Optics