Abstract

Ion beam sputtering (IBS) is an established deposition process used in the production of optical coatings. In this study, a modification of the IBS process, based on additional electromagnetic fields, is examined in an effort to improve the technology. The reported experiments reveal the underlying effects of electromagnetic fields on the distribution of the coating material sputtered from the target. An increase in local deposition rate is observed and discussed in the context of the interaction between the introduced fields and the species in the target area. First approaches toward an optimization of the observed bunching effect on the deposition material are illustrated.

© 2013 Optical Society of America

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