M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

O. Stenzel and A. Macleod, “Metal–dielectric composite optical coatings: underlying physics, main models, characterization, design and application aspects,” Adv. Opt. Technol. 1, 463–481 (2012).

P. Ma, F. Lin, and J. A. Dobrowolski, “Design and manufacture of metal/dielectric long-wavelength cutoff filters,” Appl. Opt. 50, C201–C209 (2011).
[Crossref]

K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu, “Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering,” Sol. Energy Mater. Sol. Cells 95, 2352–2356 (2011).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

Y. T. Yoon and S. S. Lee, “Transmission type color filter incorporating a silver film based etalon,” Opt. Express 18, 5344–5349 (2010).
[Crossref]

H. Savaloni and M. Firouzi-Arani, “Dependence of the optical properties of UHV deposited silver thin films on the deposition parameters and their relation to the nanostructure of the films,” Philos. Mag. 88(5), 711–736 (2008).
[Crossref]

S. Koyama, Y. Inaba, M. Kasano, and T. Murata, “A day and night vision MOS imager with robust photonic-crystal-based RGB and IR,” IEEE Trans. Electron Devices 55, 754–759 (2008).
[Crossref]

B. Badoil, F. Lemarchand, M. Cathelinaud, and M. Lequime, “Manufacturing of an absorbing filter controlled by a broadband optical monitoring,” Opt. Express 16, 12008–12017 (2008).
[Crossref]

X. Yang, Q. Zhao, B. Han, and X. Zhao, “Oxidation mechanism of silver thin films under room temperature and atmospheric environment,” J. Chin. Ceram. 36, 954–959 (2008).

H. Savaloni and A. R. Khakpour, “Substrate temperature dependence on the optical properties of Cu and Ag thin films,” Eur. Phys. J. Appl. Phys. 31, 101–112 (2005).
[Crossref]

J. Sancho-Parramon, J. Ferré-Borrull, S. Bosch, and M. C. Ferrera, “Use of information on the manufacture of samples for the optical characterization of multilayer through a global optimization,” Appl. Opt. 42, 1325–1329 (2003).
[Crossref]

F. Abelès, “Sur la propagation des ondes électromagnétiques dans les milieux stratifiés,” Ann. Phys. Paris 3, 504–520 (2003).

C. Charton and M. Fahland, “Growth of Ag films on PET deposited by magnetron sputtering,” Vacuum 68, 65–73 (2002).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, “Optical properties of metallic films for vertical-cavity optoelectronic devices,” Appl. Opt. 37, 5271–5283 (1998).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

B. T. Sullivan and K. L. Byrt, “Metal/dielectric transmission interference filters with low reflectance,” Appl. Opt. 34, 5684–5694 (1995).
[Crossref]

C. M. Herzinger and J. A. Woollam, “InP optical constants between 0.75 and 5.0  eV determined by variable angle spectroscopic ellipsometry,” J. Appl. Phys. 77, 1715–1724 (1995).
[Crossref]

T. Eisenhammer and F. Muggenthaler, “Deposition of dielectric and metallic materials on thin silver films: in situ measurement of reflectance and DC-resistance changes,” Proc. SPIE 2255, 508–518 (1994).
[Crossref]

K. Ohta and H. Ishida, “Matrix formalism for calculation of electric field intensity of light in stratified multilayered films,” Appl. Opt. 29, 1952–1959 (1990).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Variable angle of incidence spectroscopic ellipsometric (VASE) characterization of TiO2/Ag/TiO2 optical coatings,” J. Appl. Phys. 64, 3407–3410 (1988).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Ellipsometric study of ZnO/Ag/ZnO optical coatings: determination of layer thicknesses and optical constants,” Proc. SPIE 0823, 54–63 (1987).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

P. B. Johnson and R. W. Christy, “Optical constants of the noble metals,” Phys. Rev. B 6, 4370–4379 (1972).
[Crossref]

S. Yoshida, T. Yamaguchi, and A. Kinbara, “Change of the optical properties of aggregated silver films after deposition,” J. Opt. Soc. Am. 61, 463–469 (1971).
[Crossref]

T. Yamaguchi, S. Yoshida, and A. Kinbara, “Continuous ellipsometric determination of the optical constants and thickness of a silver film during deposition,” Jpn. J. Appl. Phys. 8, 559–567 (1969).
[Crossref]

F. Abelès, “Sur la propagation des ondes électromagnétiques dans les milieux stratifiés,” Ann. Phys. Paris 3, 504–520 (2003).

B. Badoil, F. Lemarchand, M. Cathelinaud, and M. Lequime, “Manufacturing of an absorbing filter controlled by a broadband optical monitoring,” Opt. Express 16, 12008–12017 (2008).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Variable angle of incidence spectroscopic ellipsometric (VASE) characterization of TiO2/Ag/TiO2 optical coatings,” J. Appl. Phys. 64, 3407–3410 (1988).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Ellipsometric study of ZnO/Ag/ZnO optical coatings: determination of layer thicknesses and optical constants,” Proc. SPIE 0823, 54–63 (1987).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

M. Born and E. Wolf, Principles of Optics (Pergamon, 1959).

J. Sancho-Parramon, J. Ferré-Borrull, S. Bosch, and M. C. Ferrera, “Use of information on the manufacture of samples for the optical characterization of multilayer through a global optimization,” Appl. Opt. 42, 1325–1329 (2003).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

B. T. Sullivan and K. L. Byrt, “Metal/dielectric transmission interference filters with low reflectance,” Appl. Opt. 34, 5684–5694 (1995).
[Crossref]

B. Badoil, F. Lemarchand, M. Cathelinaud, and M. Lequime, “Manufacturing of an absorbing filter controlled by a broadband optical monitoring,” Opt. Express 16, 12008–12017 (2008).
[Crossref]

C. Charton and M. Fahland, “Growth of Ag films on PET deposited by magnetron sputtering,” Vacuum 68, 65–73 (2002).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

P. B. Johnson and R. W. Christy, “Optical constants of the noble metals,” Phys. Rev. B 6, 4370–4379 (1972).
[Crossref]

A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, “Optical properties of metallic films for vertical-cavity optoelectronic devices,” Appl. Opt. 37, 5271–5283 (1998).
[Crossref]

P. Ma, F. Lin, and J. A. Dobrowolski, “Design and manufacture of metal/dielectric long-wavelength cutoff filters,” Appl. Opt. 50, C201–C209 (2011).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

T. Eisenhammer and F. Muggenthaler, “Deposition of dielectric and metallic materials on thin silver films: in situ measurement of reflectance and DC-resistance changes,” Proc. SPIE 2255, 508–518 (1994).
[Crossref]

A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, “Optical properties of metallic films for vertical-cavity optoelectronic devices,” Appl. Opt. 37, 5271–5283 (1998).
[Crossref]

C. Charton and M. Fahland, “Growth of Ag films on PET deposited by magnetron sputtering,” Vacuum 68, 65–73 (2002).
[Crossref]

J. Sancho-Parramon, J. Ferré-Borrull, S. Bosch, and M. C. Ferrera, “Use of information on the manufacture of samples for the optical characterization of multilayer through a global optimization,” Appl. Opt. 42, 1325–1329 (2003).
[Crossref]

J. Sancho-Parramon, J. Ferré-Borrull, S. Bosch, and M. C. Ferrera, “Use of information on the manufacture of samples for the optical characterization of multilayer through a global optimization,” Appl. Opt. 42, 1325–1329 (2003).
[Crossref]

H. Savaloni and M. Firouzi-Arani, “Dependence of the optical properties of UHV deposited silver thin films on the deposition parameters and their relation to the nanostructure of the films,” Philos. Mag. 88(5), 711–736 (2008).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

P. Gidon and G. Grand, “Optical filter matrix structure and associated image sensor,” U.S. patentWO2008/012235A1 (31January2008).

P. Gidon and G. Grand, “Optical filter matrix structure and associated image sensor,” U.S. patentWO2008/012235A1 (31January2008).

X. Yang, Q. Zhao, B. Han, and X. Zhao, “Oxidation mechanism of silver thin films under room temperature and atmospheric environment,” J. Chin. Ceram. 36, 954–959 (2008).

M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

C. M. Herzinger and J. A. Woollam, “InP optical constants between 0.75 and 5.0  eV determined by variable angle spectroscopic ellipsometry,” J. Appl. Phys. 77, 1715–1724 (1995).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

S. Koyama, Y. Inaba, M. Kasano, and T. Murata, “A day and night vision MOS imager with robust photonic-crystal-based RGB and IR,” IEEE Trans. Electron Devices 55, 754–759 (2008).
[Crossref]

K. Ohta and H. Ishida, “Matrix formalism for calculation of electric field intensity of light in stratified multilayered films,” Appl. Opt. 29, 1952–1959 (1990).
[Crossref]

P. B. Johnson and R. W. Christy, “Optical constants of the noble metals,” Phys. Rev. B 6, 4370–4379 (1972).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

S. Koyama, Y. Inaba, M. Kasano, and T. Murata, “A day and night vision MOS imager with robust photonic-crystal-based RGB and IR,” IEEE Trans. Electron Devices 55, 754–759 (2008).
[Crossref]

K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu, “Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering,” Sol. Energy Mater. Sol. Cells 95, 2352–2356 (2011).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

H. Savaloni and A. R. Khakpour, “Substrate temperature dependence on the optical properties of Cu and Ag thin films,” Eur. Phys. J. Appl. Phys. 31, 101–112 (2005).
[Crossref]

S. Yoshida, T. Yamaguchi, and A. Kinbara, “Change of the optical properties of aggregated silver films after deposition,” J. Opt. Soc. Am. 61, 463–469 (1971).
[Crossref]

T. Yamaguchi, S. Yoshida, and A. Kinbara, “Continuous ellipsometric determination of the optical constants and thickness of a silver film during deposition,” Jpn. J. Appl. Phys. 8, 559–567 (1969).
[Crossref]

S. Koyama, Y. Inaba, M. Kasano, and T. Murata, “A day and night vision MOS imager with robust photonic-crystal-based RGB and IR,” IEEE Trans. Electron Devices 55, 754–759 (2008).
[Crossref]

U. Kreibig, Optical Properties of Metal Clusters (Springer-Verlag, 1995).

Y. T. Yoon and S. S. Lee, “Transmission type color filter incorporating a silver film based etalon,” Opt. Express 18, 5344–5349 (2010).
[Crossref]

B. Badoil, F. Lemarchand, M. Cathelinaud, and M. Lequime, “Manufacturing of an absorbing filter controlled by a broadband optical monitoring,” Opt. Express 16, 12008–12017 (2008).
[Crossref]

B. Badoil, F. Lemarchand, M. Cathelinaud, and M. Lequime, “Manufacturing of an absorbing filter controlled by a broadband optical monitoring,” Opt. Express 16, 12008–12017 (2008).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

P. Ma, F. Lin, and J. A. Dobrowolski, “Design and manufacture of metal/dielectric long-wavelength cutoff filters,” Appl. Opt. 50, C201–C209 (2011).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

P. Ma, F. Lin, and J. A. Dobrowolski, “Design and manufacture of metal/dielectric long-wavelength cutoff filters,” Appl. Opt. 50, C201–C209 (2011).
[Crossref]

O. Stenzel and A. Macleod, “Metal–dielectric composite optical coatings: underlying physics, main models, characterization, design and application aspects,” Adv. Opt. Technol. 1, 463–481 (2012).

H. A. Macleod, Thin-Film Optical Filters III (Institute of Physics, 2001).

A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, “Optical properties of metallic films for vertical-cavity optoelectronic devices,” Appl. Opt. 37, 5271–5283 (1998).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Variable angle of incidence spectroscopic ellipsometric (VASE) characterization of TiO2/Ag/TiO2 optical coatings,” J. Appl. Phys. 64, 3407–3410 (1988).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Ellipsometric study of ZnO/Ag/ZnO optical coatings: determination of layer thicknesses and optical constants,” Proc. SPIE 0823, 54–63 (1987).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

T. Eisenhammer and F. Muggenthaler, “Deposition of dielectric and metallic materials on thin silver films: in situ measurement of reflectance and DC-resistance changes,” Proc. SPIE 2255, 508–518 (1994).
[Crossref]

S. Koyama, Y. Inaba, M. Kasano, and T. Murata, “A day and night vision MOS imager with robust photonic-crystal-based RGB and IR,” IEEE Trans. Electron Devices 55, 754–759 (2008).
[Crossref]

K. Ohta and H. Ishida, “Matrix formalism for calculation of electric field intensity of light in stratified multilayered films,” Appl. Opt. 29, 1952–1959 (1990).
[Crossref]

K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu, “Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering,” Sol. Energy Mater. Sol. Cells 95, 2352–2356 (2011).
[Crossref]

E. D. Palik, Handbook of Optical Constants of Solids III (Academic, 1997).

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

L. Frey, P. Parrein, J. Raby, C. Pellé, D. Hérault, M. Marty, and J. Michailos, “Color filters including infrared cut-off integrated on CMOS image sensor,” Opt. Express 19, 13073–13080 (2011).
[Crossref]

A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewski, “Optical properties of metallic films for vertical-cavity optoelectronic devices,” Appl. Opt. 37, 5271–5283 (1998).
[Crossref]

J. Sancho-Parramon, J. Ferré-Borrull, S. Bosch, and M. C. Ferrera, “Use of information on the manufacture of samples for the optical characterization of multilayer through a global optimization,” Appl. Opt. 42, 1325–1329 (2003).
[Crossref]

H. Savaloni and M. Firouzi-Arani, “Dependence of the optical properties of UHV deposited silver thin films on the deposition parameters and their relation to the nanostructure of the films,” Philos. Mag. 88(5), 711–736 (2008).
[Crossref]

H. Savaloni and A. R. Khakpour, “Substrate temperature dependence on the optical properties of Cu and Ag thin films,” Eur. Phys. J. Appl. Phys. 31, 101–112 (2005).
[Crossref]

M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, “Transparent, metallo-dielectric, one-dimensional, photonic band-gap structures,” J. Appl. Phys. 83, 2377–2383 (1998).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

O. Stenzel and A. Macleod, “Metal–dielectric composite optical coatings: underlying physics, main models, characterization, design and application aspects,” Adv. Opt. Technol. 1, 463–481 (2012).

M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

B. T. Sullivan and K. L. Byrt, “Metal/dielectric transmission interference filters with low reflectance,” Appl. Opt. 34, 5684–5694 (1995).
[Crossref]

F. Parmigiani, E. Kay, T. C. Huang, J. Perrin, M. Jurich, and J. D. Swalen, “Optical and electrical properties of thin silver films grown under ion bombardment,” Phys. Rev. B 33, 879–888 (1986).
[Crossref]

K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu, “Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering,” Sol. Energy Mater. Sol. Cells 95, 2352–2356 (2011).
[Crossref]

K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu, “Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering,” Sol. Energy Mater. Sol. Cells 95, 2352–2356 (2011).
[Crossref]

M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

M. Held, O. Stenzel, S. Wilbrandt, N. Kaiser, and A. Tünnermann, “Manufacture and characterization of optical coatings with incorporated copper island films,” Appl. Opt. 51, 4436–4447 (2012).
[Crossref]

M. Born and E. Wolf, Principles of Optics (Pergamon, 1959).

C. M. Herzinger and J. A. Woollam, “InP optical constants between 0.75 and 5.0  eV determined by variable angle spectroscopic ellipsometry,” J. Appl. Phys. 77, 1715–1724 (1995).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Variable angle of incidence spectroscopic ellipsometric (VASE) characterization of TiO2/Ag/TiO2 optical coatings,” J. Appl. Phys. 64, 3407–3410 (1988).
[Crossref]

K. Memarzadeh, J. A. Woollam, and A. Belkind, “Ellipsometric study of ZnO/Ag/ZnO optical coatings: determination of layer thicknesses and optical constants,” Proc. SPIE 0823, 54–63 (1987).
[Crossref]

S. Yoshida, T. Yamaguchi, and A. Kinbara, “Change of the optical properties of aggregated silver films after deposition,” J. Opt. Soc. Am. 61, 463–469 (1971).
[Crossref]

T. Yamaguchi, S. Yoshida, and A. Kinbara, “Continuous ellipsometric determination of the optical constants and thickness of a silver film during deposition,” Jpn. J. Appl. Phys. 8, 559–567 (1969).
[Crossref]

X. Yang, Q. Zhao, B. Han, and X. Zhao, “Oxidation mechanism of silver thin films under room temperature and atmospheric environment,” J. Chin. Ceram. 36, 954–959 (2008).

Y. T. Yoon and S. S. Lee, “Transmission type color filter incorporating a silver film based etalon,” Opt. Express 18, 5344–5349 (2010).
[Crossref]

S. Yoshida, T. Yamaguchi, and A. Kinbara, “Change of the optical properties of aggregated silver films after deposition,” J. Opt. Soc. Am. 61, 463–469 (1971).
[Crossref]

T. Yamaguchi, S. Yoshida, and A. Kinbara, “Continuous ellipsometric determination of the optical constants and thickness of a silver film during deposition,” Jpn. J. Appl. Phys. 8, 559–567 (1969).
[Crossref]

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

X. Yang, Q. Zhao, B. Han, and X. Zhao, “Oxidation mechanism of silver thin films under room temperature and atmospheric environment,” J. Chin. Ceram. 36, 954–959 (2008).

X. Yang, Q. Zhao, B. Han, and X. Zhao, “Oxidation mechanism of silver thin films under room temperature and atmospheric environment,” J. Chin. Ceram. 36, 954–959 (2008).

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, “Analysis of the Drude model in metallic films,” Appl. Opt. 40, 6307–6311 (2001).
[Crossref]

O. Stenzel and A. Macleod, “Metal–dielectric composite optical coatings: underlying physics, main models, characterization, design and application aspects,” Adv. Opt. Technol. 1, 463–481 (2012).

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