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Proximity-effect correction for 3D single-photon optical lithography

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Abstract

A proximity-effect-correction (PEC) algorithm for three-dimensional (3D) single-photon gray-scale photolithography is proposed and numerically analyzed in this paper. The gray-scale dose assigned to every point within the photoresist volume is optimized to guarantee that the fabricated 3D patterns are as close to the designed patterns as possible. PEC optimizations for 3D woodpile geometries using low and high absorption photoresist are simulated. Spatial resolution of the proposed PEC algorithm is numerically studied. We also investigated the efficacy of our algorithm on a variety of related 3D geometries.

© 2015 Optical Society of America

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