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Cost-effective mid-infrared micropolarizer fabricated on common silicon by soft nanoimprint lithography

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Abstract

We fabricated a cost-effective mid-IR micropolarizer on a common Si substrate. To improve the transmittance of Si, we performed a double oxidation on the silicon substrate. The SiO2-Si-SiO2 structure improved the transmittance of Si from 54% to 63%–83%. Then, the mid-IR micropolarizer with multidirectional gratings was fabricated using a soft nanoimprint process followed by the thermal evaporation of Al. Experimental measurements showed a transverse magnetic transmittance in the range of 61%–80% at wavelengths of 4–5 μm, and the extinction ratio was greater than 19 dB.

© 2019 Optical Society of America

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