2019 Topical Meeting on Optical Interference Coatings: Manufacturing Problem Contest [invited]

Daniel Poitras; Li Li; Michael R. Jacobson; Catherine C. Cooksey

doi:10.1364/AO.59.000A31

Applied Optics
Vol. 59,
Issue 5,
pp. A31-A39
(2020)
•https://doi.org/10.1364/AO.59.000A31

2019 Topical Meeting on Optical Interference Coatings: Manufacturing Problem Contest [invited]

Daniel Poitras, Li Li, Michael R. Jacobson, and Catherine C. Cooksey

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Daniel Poitras, Li Li, Michael R. Jacobson, and Catherine C. Cooksey, "2019 Topical Meeting on Optical Interference Coatings: Manufacturing Problem Contest [invited]," Appl. Opt. 59, A31-A39 (2020)

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Abstract

For the seventh Manufacturing Problem Contest, participants were challenged to fabricate an optical filter with transmittance specified for $s$-polarization at two incident angles: 10° and 50° from 400 nm to 1100 nm. The problem required that contestants be equally versed in the design, deposition, and measurement of optical filters in order to achieve good results. Eight teams from five different countries participated in the contest using various deposition techniques. The fabricated filters had a total thickness between 8.2 µm and 17.6 µm and a total number of layers from 74 to 255, which were deposited onto one or both sides of the substrate. The performances of the filters were measured by two independent laboratories. The evaluation results were presented at the Topical Meeting on Optical Interference Coatings conference held in Santa Ana Pueblo, New Mexico, in June 2019.

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Supplementary Material (1)

Name	Description
Dataset 1	Target data for the OIC2019 Manufacturing Problem

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Team	Organization
Zach Gerig	Five Nine Optics, Boulder CO, USA
Julien Lumeau, Thomas Begou, Antonin Moreau, Frédéric Lemarquis, Cihan Koc, and Fabien Lemarchand	Institut Fresnel, Marseille, France
Vladimir Ponomarev and Vitaly Dogel	OptiSpark, Moscow, Russian Federation
Marc Lappschies and Jan Brossmann	Optics Balzers, Jena, Germany
Masahiro Akiba	TOPCON Corporation, Tokyo, Japan
Karen Hendrix	Viavi Solutions, Santa Rosa CA, USA
Tim Gustafson	Viavi Solutions, Santa Rosa CA, USA
Lucas Alves	Viavi Solutions, Santa Rosa CA, USA

	ODA	NIST
Instrument	Cary 5000	Perkin Elmer Lambda 1050
Beams	Double-grating and double beam	Double-beam
Wavelength range	400 nm to 1100 nm, 1.0 nm steps	400 nm to 1100 nm, 1.0 nm steps
Light-source	Tungsten-halogen/deuterium	Tungsten-halogen/deuterium
Detectors	Photomultiplier/PbS	Photomultiplier/InGaAs
Transmittance accuracy	$\pm 0.4 %$ in visible and NIR	$\pm 0.4 %$ in visible and NIR

Information from Participants					Information from Evaluation Labs
	Nb. Layers(front+back coatings)	Total Thickness (µm)	MF Design	MF Meas	MF ODA	MF NIST	MF Ave.	Rank	Additional Information from Participants
S01	224	17.6	2.030	3.671	$3.574 \pm 0.011$	$3.830 \pm 0.011$	$3.020 \pm 0.008$	8	Magnetron sputtering
S02	125 ( $68 + 57$ )	11.8 ( $6. 5 + 5. 3$ )	0.59	0.88	$0. 891 \pm 0. 011$	$1. 436 \pm 0. 011$	$1.164 \pm 0. 008$	1	(Winning Sample!)Ion-beam sputtering; deposition time monitoring
S03	178	12.9	2.14	2.53	$2.530 \pm 0.011$	$2.640 \pm 0.011$	$2.585 \pm 0.008$	5	Magnetron sputtering
S04	255	16.1	1.106	2.411	$2.539 \pm 0.011$	$2.451 \pm 0.011$	$2.495 \pm 0.008$	4	Magnetron sputtering
S05	164 ( $86 + 78$ )	12.97 ( $6.57 + 6.40$ )	0.445	1.608	$1.728 \pm 0.011$	$1.644 \pm 0.011$	$1.686 \pm 0.008$	2	Plasma-assisted magnetron sputtering (Bühler Helios800), optical broadband monitoring
S06	126 ( $64 + 62$ )	13.92 ( $7.32 + 6.60$ )	0.740	7.130	$6.478 \pm 0.011$	$6.141 \pm 0.011$	$6.309 \pm 0.008$	9	Plasma-assisted evaporation (Bühler SYRUSpro); Buhler OMS5000 monitoring
S07	138 ( $70 + 68$ )	12.53 ( $6.47 + 6.06$ )	0.439	2.353	$2.272 \pm 0.011$	$2.090 \pm 0.011$	$2.181 \pm 0.008$	3
S08	74 ( $42 + 32$ )	8.24 ( $3.73 + 4.51$ )	0.46	2.646	$2.890 \pm 0.011$	$3.001 \pm 0.011$	$2.945 \pm 0.008$	7	Plasma-assisted evaporation (Bühler SYRUSpro710); Bühler OMS5000 monitoring
S09	138 ( $74 + 64$ )	14.03 ( $7.36 + 6.67$ )	0.46	2.61	$2.489 \pm 0.011$	$2.852 \pm 0.011$	$2.670 \pm 0.008$	6	Plasma-assisted magnetron sputtering (Bühler HELIOS); monitoring Bühler OMS5100

Team	Organization
Zach Gerig	Five Nine Optics, Boulder CO, USA
Julien Lumeau, Thomas Begou, Antonin Moreau, Frédéric Lemarquis, Cihan Koc, and Fabien Lemarchand	Institut Fresnel, Marseille, France
Vladimir Ponomarev and Vitaly Dogel	OptiSpark, Moscow, Russian Federation
Marc Lappschies and Jan Brossmann	Optics Balzers, Jena, Germany
Masahiro Akiba	TOPCON Corporation, Tokyo, Japan
Karen Hendrix	Viavi Solutions, Santa Rosa CA, USA
Tim Gustafson	Viavi Solutions, Santa Rosa CA, USA
Lucas Alves	Viavi Solutions, Santa Rosa CA, USA

	ODA	NIST
Instrument	Cary 5000	Perkin Elmer Lambda 1050
Beams	Double-grating and double beam	Double-beam
Wavelength range	400 nm to 1100 nm, 1.0 nm steps	400 nm to 1100 nm, 1.0 nm steps
Light-source	Tungsten-halogen/deuterium	Tungsten-halogen/deuterium
Detectors	Photomultiplier/PbS	Photomultiplier/InGaAs
Transmittance accuracy	$\pm 0.4 %$ in visible and NIR	$\pm 0.4 %$ in visible and NIR

Abstract

Supplementary Material (1)

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Tables (3)

Equations (1)

Applied Optics