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Method for exposure dose monitoring and control in scanning beam interference lithography

Ying Song, Yujuan Liu, Shan Jiang, Yang Zhu, Liu Zhang, and Zhaowu Liu

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Abstract

To improve grating manufacturing process controllability in scanning beam interference lithography (SBIL), a novel method for exposure dose monitoring and control is proposed. Several zones in a narrow monitoring region are fabricated on a grating substrate by piecewise uniform scanning. Two monitoring modes are given based on the different widths of the monitoring region. The monitoring curve of the latent image diffraction efficiency to scanning velocity is calculated by rigorous coupled wave analysis. The calculation results show that the exposure dose in SBIL can be monitored by the shape change of the monitoring curve, and an optimized scanning velocity can be selected in the monitoring curve to control the exposure dose.

© 2021 Optical Society of America

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Data Availability

Data underlying the results presented in this paper are available in Ref. [15], Ref. [16], and Ref. [18].

15. K. Peng, Bayanheshig, L. Wenhao, and T. Yuguo, “Modeling and in-situ monitoring of the asymmetric exposure and development of holographic grating,” Acta Opt. Sinica 30, 65–69 (2010).

16. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, “Characterization of positive photoresist,” IEEE Trans. Electron Devices 22, 445–452 (1975). [CrossRef]  

18. Microposit S1800 series photo resists (Shipley Company).

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