Abstract

We propose a novel measurement algorithm for wafer alignment technology based on principal component analysis (PCA) of a mark image. The waveform of the mark is extracted from the enlarged mark image, which is collected by CCD. The position of the mark center on the CCD can be calculated based on the extracted waveform. By applying PCA to the mark image, the first principal component containing position information of the mark can be obtained. Therefore PCA can be used to extract the waveform from the mark image. Compared with the typical waveform extraction method (the summed projection (SP) method), the proposed PCA method can use the position information contained in the mark image more effectively. Through simulation and experiment, it is proved that the proposed PCA method can improve the contrast of the normalized waveform, and then improve the alignment accuracy.

© 2021 Optical Society of America

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