Abstract

The nonlinear errors caused by the gamma effect seriously affect the measurement accuracy of phase-measuring profilometry systems. We present a novel robust end-to-end pattern optimization technology for phase-height mapping. This method generates standard sinusoidal patterns on the reference plane on a camera image instead of on a projection image by optimizing the projection image, which can avoid phase errors due to phase conversion from projector to camera. The pixel set mapping is achieved by chessboard calibration; then the projection image is optimized with the multiscale optimization method and the dislocation optimization method based on proportional integral derivative control. The experiments show that the proposed method can effectively avoid the influence of nonlinear effect and achieve high-quality three-dimensional measurement.

© 2021 Optical Society of America

Optimized dithering approach for 3D shape measurement using a phase-based chaos genetic algorithm

Peng Zhang, Bo Lu, Shifeng Wang, Xin Meng, Tiankai Chen, and Shimin Hu
Appl. Opt. 62(10) D8-D16 (2023)

Passive binary defocusing for large depth 3D measurement based on deep learning

Yueyang Li, Junfei Shen, Zhoujie Wu, and Qican Zhang
Appl. Opt. 60(24) 7243-7253 (2021)

3D shape measurement method for high-reflection surface based on fringe projection

Shenhua Zhang, Yanxi Yang, Wenwen Shi, Lianqiang Feng, and Licong Jiao
Appl. Opt. 60(34) 10555-10563 (2021)

Active projection nonlinear γ correction method for fringe projection profilometry

Lin Wang, Yuetong Zhang, Lina Yi, Xin Hao, Meiyi Wang, and Xiangjun Wang
J. Opt. Soc. Am. A 39(11) 1983-1991 (2022)

High-quality 3D shape measurement by kernel-optimized high sinusoidal similarity dither patterns

Peng Zhou, Ning Cai, Ting Wang, Xiang-Qun Cao, and Bin Lin
Appl. Opt. 59(34) 10645-10650 (2020)