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Abstract
A novel, to the best of our knowledge, thickness measurement scheme based on a phase shifting spectrally resolved interferometry is proposed for a thin film measurement from spectral reflectance and phase in a single sequence. This purpose is realized by introducing a spectral reflectance phase surface (SRPS). The spectral phase, originally existing in the form of an imaginary term, is revealed as a real term with the spectral reflectance due to the proposition of SRPS. Therefore, the reflectance and phase are contained in a single parameter, SRPS, and are measured in a single sequence. The phase shift error compensation is presented to form the accurate SRPS and ensure the performance of the measurement. The thickness of the sample is determined as the measured SRPS, and the theoretical SRPSs are compared by the cross correlation method. The performance of the proposed system is validated by measuring several samples of the ${\rm SiO_2}$ on a silicon substrate and comparing the results with the commercial ellipsometer.
© 2021 Optical Society of America
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