Patterned liquid crystal polymer C-plate retarder and color polarizer

Sawyer Miller; Linan Jiang; Xingzhou Tu; Stanley Pau

doi:10.1364/AO.416845

Applied Optics
Vol. 60,
Issue 6,
pp. 1500-1507
(2021)
•https://doi.org/10.1364/AO.416845

Patterned liquid crystal polymer C-plate retarder and color polarizer

Sawyer Miller, Linan Jiang, Xingzhou Tu, and Stanley Pau

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Sawyer Miller, Linan Jiang, Xingzhou Tu, and Stanley Pau, "Patterned liquid crystal polymer C-plate retarder and color polarizer," Appl. Opt. 60, 1500-1507 (2021)

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- Optical Devices, Sensors, and Detectors
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About this Article
History
- Original Manuscript: December 16, 2020
- Revised Manuscript: January 19, 2021
- Manuscript Accepted: January 21, 2021
- Published: February 12, 2021

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Abstract

The patternability and guest–host interaction with dichroic dye and C-plate liquid crystal polymer (LCP) materials are investigated, and the optical properties of a thin film C-plate retarder and polarizer are studied and compared with theory. The C-plate retarder is a waveplate made of a uniaxial LCP where the optical axis of the LCP is parallel to the surface normal of the optic. No retardance is observed at a normal angle of incidence and retardance grows as the angle of incidence increases. The C-plate polarizer is a C-plate retarder with LCP as the host and a dichroic dye as the guest. The linear diattenuation (LD) of the linear polarizer is zero at a normal angle of incidence and grows with an increasing angle of incidence. Both the C-plate retarder and polarizer can be patterned with minimum feature size down to 2 µm by using ultraviolet photolithography and plasma etching. A planarization process is also developed to deposit a cover layer on top of the pattern to reduce optical loss and to serve as a barrier for subsequent layers.

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References	Viewing Cone	Number of Layers	Layer Configuration (Top to Bottom)	Minimum Transmittance
Ref. [13]	$\pm 80^{\circ}$	5	Biaxial plate, +A, −C, MVA cell, +A	$5 \times 10^{- 4}$
Ref. [14]	$\pm 85^{\circ}$	2	Biaxial plate, Biaxial plate	$8.23 \times 10^{- 5}$
Ref. [15]	$\pm 85^{\circ}$	10	+A, +C, +A, −C, +A, +A, −C, +A, +C, +A	$3.79 \times 10^{- 4}$
Ref. [16]	$\pm 90^{\circ}$	3	+A, −A, +C	$2.87 \times 10^{- 4}$
This work	$\pm 90^{\circ}$	2	C-plate polarizer, -C	$4.31 \times 10^{- 4}$

Material	Gas Flow Rate	Pressure	ICP Power	RIE Power	Etch Time
$S i O_{2}$	${C H F}_{3}$ : 50 sccm $O_{2}$ : 5 sccm	5 mT	400 W	100 W	75 s
LCP	$O_{2}$ : 50 sccm Ar: 5 sccm	5 mT	500 W	59 W	345 s

References	Viewing Cone	Number of Layers	Layer Configuration (Top to Bottom)	Minimum Transmittance
Ref. [13]	$\pm 80^{\circ}$	5	Biaxial plate, +A, −C, MVA cell, +A	$5 \times 10^{- 4}$
Ref. [14]	$\pm 85^{\circ}$	2	Biaxial plate, Biaxial plate	$8.23 \times 10^{- 5}$
Ref. [15]	$\pm 85^{\circ}$	10	+A, +C, +A, −C, +A, +A, −C, +A, +C, +A	$3.79 \times 10^{- 4}$
Ref. [16]	$\pm 90^{\circ}$	3	+A, −A, +C	$2.87 \times 10^{- 4}$
This work	$\pm 90^{\circ}$	2	C-plate polarizer, -C	$4.31 \times 10^{- 4}$

Material	Gas Flow Rate	Pressure	ICP Power	RIE Power	Etch Time
$S i O_{2}$	${C H F}_{3}$ : 50 sccm $O_{2}$ : 5 sccm	5 mT	400 W	100 W	75 s
LCP	$O_{2}$ : 50 sccm Ar: 5 sccm	5 mT	500 W	59 W	345 s

Abstract

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Applied Optics