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Nanopatterning of monolayer graphene by quantum optical lithography

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Abstract

Quantum optical lithography, a diffraction-unlimited method, was applied to pattern monolayer graphene at 10 nm resolution. In our tests with chemical vapor deposition monolayer graphene samples, we have succeeded in producing flat surfaces of a sandwich of monolayer graphene-resist on Si, ${{\rm{Si}}_3}{{\rm{N}}_4}$, or glass substrates. Complex patterns have been written on monolayer graphene samples by a nanoablation process. The method could be used to realize monolayer graphene nanodevices.

© 2021 Optical Society of America

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No data were generated or analyzed in the presented research.

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