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Rapid polishing process for the x ray reflector

Lianmin Yin, Zhifan Lin, Hao Hu, and Yifan Dai

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Abstract

X ray mirrors are symmetrical workpieces along the length and width and are widely used in various optical systems. Unlike the center-symmetric circular mirror, it is more difficult to suppress the edge effect of the x ray mirror during the polishing process, which greatly limits the polishing accuracy and polishing efficiency. Based on this, the unique edge effect of x ray mirrors is investigated in depth in this paper. First, the causes and distribution laws of the edge effect of the x ray mirror were obtained by analyzing the inherent structure of the computer controlled optical surface (CCOS) and the motion trajectory of the polishing tool. Second, a mathematical model was established based on the material removal states of different regions on the x ray mirror. Finally, a combined polishing process based on the influence function of different shaped tools is proposed and experimentally verified. The results show that the edge effect on the x ray mirror is significantly weakened and its surface errors peak to valley (PV) and RMS are increased by 21.5 times and 47.9 times, respectively. This indicates that the combined polishing process has a good suppression effect on the edge effect of the x ray mirror.

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Data underlying the results presented in this paper may be obtained from the authors upon reasonable request.

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