Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory

Wei Tan; Huiru Ji; Yan Mo; Donglin Ma; Donglin Ma

doi:10.1364/AO.467761

Applied Optics
Vol. 61,
Issue 29,
pp. 8633-8640
(2022)
•https://doi.org/10.1364/AO.467761

Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory

Wei Tan, Huiru Ji, Yan Mo, and Donglin Ma

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Wei Tan, Huiru Ji, Yan Mo, and Donglin Ma, "Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory," Appl. Opt. 61, 8633-8640 (2022)

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Table of Contents Category
- Optical Design and Fabrication
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About this Article
History
- Original Manuscript: June 20, 2022
- Revised Manuscript: September 1, 2022
- Manuscript Accepted: September 5, 2022
- Published: October 3, 2022

Abstract

In this paper, a method is proposed to solve the initial optical structure of an off-axis multimirror system for an extreme ultraviolet lithography (EUVL) application. By tracing the characteristic rays, the primary aberration can be expressed as a function of the distance and curvature based on the Seidel aberration theory. The initial structure with a favorable aberration performance is calculated when the function value is 0. We solve two different initial structures with an off-axis, six-mirror configuration with different optical powers. The NA of the finally optimized optical system is 0.25, the wavefront aberration rms value is less than ${0.04}\lambda$, and the absolute distortion is below 1.2 nm.

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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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Surface	Radius/mm	Distance/mm	Conic
Object	—	599.882	—
M1	−475.666	−153.218	−14.077
M2 (stop)	−411.2190	145.906	−10.884
M3	704.920	−265.336	−16.928
M4	465.054	579.171	0.359
M5	297.866	−239.659	−47.756
M6	300.002	281.828	−0.095
Image	—	—	—

Surface	Radius/mm	Distance/mm	Conic
Object	—	582.777	—
M1	−1369.140	−264.819	−38.299
M2 (Stop)	1169.405	424.051	2.802
M3	275.609	−130.266	−0.771
M4	333.320	522.848	−7.900
M5	260.564	−244.1162	1.402
M6	300.041	275.201	0.057
Image	—	—	—

Parameters	Specifications
Wavelength	13.5 nm
NA	0.25
FOV	$26 m m \times 1.5 m m$
Magnification	1/4
Wavefront error	$< 0.52 n m (0.4 λ)$
Max distortion	1.2 nm
Chief ray angle on the mask	5.06°
Image telecentricity	0.01°

Parameters	Specifications
Wavelength	13.5 nm
NA	0.25
FOV	$26 m m \times 1.5 m m$
Magnification	1/4
Wavefront error	$< 0.58 n m (0.43 λ)$
Max distortion	0.8 nm
Chief ray angle on the mask	5.59°
Image telecentricity	0.02°

Surface	Radius	Distance	Decenter in $x$	Decenter in $y$	Tilt in $x$	Tilt in $y$
M1	$\pm 1.0 µ m$	$\pm 0.1 µ m$	$\pm 0.1 µ m$	$\pm 0.1 µ m$	$\pm {0.36}^{''}$	$\pm {0.36}^{''}$
M2	$\pm 1.0 µ m$	$\pm 0.1 µ m$	$\pm 1.0 µ m$	$\pm 0.1 µ m$	$\pm {0.72}^{''}$	$\pm {0.72}^{''}$
M3	$\pm 0.1 µ m$	$\pm 0.01 µ m$	$\pm 0.01 µ m$	$\pm 0.01 µ m$	$\pm {0.36}^{''}$	$\pm {0.36}^{''}$
M4	$\pm 0.01 µ m$	$\pm 0.01 µ m$	$\pm 0.01 µ m$	$\pm 0.01 µ m$	$\pm {0.036}^{''}$	$\pm {0.036}^{''}$
M5	$\pm 0.1 µ m$	$\pm 0.1 µ m$	$\pm 0.1 µ m$	$\pm 0.01 µ m$	$\pm {0.36}^{''}$	$\pm {0.36}^{''}$
M6	$\pm 0.1 µ m$	$\pm 0.1 µ m$	$\pm 0.05 µ m$	$\pm 0.05 µ m$	$\pm {0.36}^{''}$	$\pm {0.36}^{''}$

Abstract

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Equations (8)

Applied Optics