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Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Zhiyuan Niu, Sikun Li, and Yang Liu

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Abstract

Double-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light. The model is accurate and can be used in the study of double-Ronchi shearing interferometry.

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Corrections

14 June 2023: A correction was made to designating the corresponding author.

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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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