Abstract
A crystalline silicon thin-film solar cell with a three-layer sinusoidal grating structure is studied. The structure has a double-layer antireflection layer, and the three-layer grating is located in the double-layer antireflection layer and the passivation layer, respectively. The related parameters of the grating structure are optimized by scanning using finite-difference time-domain. The optimization results show that cutting the sinusoidal grating structure can significantly improve the light absorption efficiency of the cell for near-infrared light (750–1100 nm), and the enhancement effect is mainly in the transverse electric (TE)-polarized light. This is because the localized surface plasmon resonance and optical waveguide mode under TE-polarized light can be fully excited after the sinusoidal structure is cut. The short-circuit current density (${J_{\rm{SC}}}$) of the optimized three-layer sinusoidal grating structure is ${19.82}\;{{\rm mA/cm}^2}$, which is 112.43% higher than that of the planar structure with the same parameters and 23.18% higher than that of the uncut sinusoidal grating structure with the same parameters.
© 2023 Optica Publishing Group
Full Article | PDF ArticleMore Like This
Ke Chen, Rui Wu, Hongmei Zheng, Yuanyuan Wang, and Xiaopeng Yu
Appl. Opt. 57(19) 5348-5355 (2018)
Ke Chen, Rui Wu, Hongmei Zheng, Haishuo Wang, Guojun Zhang, and Shunhua Chen
Appl. Opt. 58(31) 8702-8712 (2019)
Hongmei Zheng, Yingchun Yu, Rui Wu, Sheng Wu, Shunhua Chen, and Ke Chen
Appl. Opt. 59(33) 10330-10338 (2020)