Mask correction method for surface plasmon lithography

Le Ma; Le Ma; Libin Zhang; Libin Zhang; Jianfang He; Jianfang He; Huwen Ding; Huwen Ding; Yayi Wei; Yayi Wei

doi:10.1364/AO.509520

Applied Optics
Vol. 63,
Issue 2,
pp. 499-505
(2024)
•https://doi.org/10.1364/AO.509520

Mask correction method for surface plasmon lithography

Le Ma, Libin Zhang, Jianfang He, Huwen Ding, and Yayi Wei

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Le Ma, Libin Zhang, Jianfang He, Huwen Ding, and Yayi Wei, "Mask correction method for surface plasmon lithography," Appl. Opt. 63, 499-505 (2024)

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Table of Contents Category
- Surface Optics and Plasmonics
Optics & Photonics Topics
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About this Article
History
- Original Manuscript: October 23, 2023
- Revised Manuscript: December 8, 2023
- Manuscript Accepted: December 8, 2023
- Published: January 8, 2024

Abstract

Surface plasmon lithography (SPL) has emerged as an innovative approach to nano-fabrication, offering an alternative to traditional patterning methods. To enhance its pattern fidelity in manufacturing, it is essential to incorporate mask correction to reduce critical dimension (CD) errors between the intended target features and the photoresist image. Traditionally, the aerial image of SPL has been modeled and simulated using methods such as finite difference time domain (FDTD) or rigorous coupled wave analysis (RCWA). These models have allowed us to obtain aerial images of the mask patterns. However, relying solely on the aerial image proves insufficient for meeting the rigorous manufacturing standards for mask correction. In our research, we propose a comprehensive model that combines the optical model, employing the FDTD method, and the resist model, tailored to the specific surface plasmon lithography process. Test patterns were meticulously designed with a target CD of 130 nm, and the model was applied to simulate these test patterns, producing the after-development image (ADI) under predefined process conditions. Following a thorough analysis and data processing of the test patterns and ADI data, we established rule tables for the correction of both 1D line patterns and line end patterns. The simulation results unequivocally demonstrate the improved CD error performance achieved by the post-corrected patterns.

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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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Target-CD	Space	Pitch	ADI CD	CD Error		Correction
120	135	255	43.7	−76.3	−63.6%	$+ 15$
120	140	260	95.5	−24.5	−20.4%	$+ 5$
120	145	265	112.6	−7.4	−6.2%	0
120	150	270	169.8	49.8	41.5%	0
125	130	255	76.1	−48.9	−39.1%	$+ 10$
125	135	260	103	−22.0	−17.6%	$+ 5$
125	140	265	146.7	21.7	17.4%	−5
125	145	270	178.2	53.2	42.6%	−5
130	120	250	144	14.0	10.8%	0
130	125	255	102.9	−27.1	−20.8%	$+ 5$
130	130	260	130	0.0	0.0%	0
130	135	265	175.8	45.8	35.2%	−5
135	115	250	97.5	−37.5	−27.8%	−5
135	120	255	113.5	−21.5	−15.9%	0
140	105	245	39.1	−100.9	−72.1%	0
140	110	250	90.3	−49.7	−35.5%	−10

Target-CD	Corrected-CD	Space	Pitch	ADI-CD	CD Error
120	135	120	255	113.5	−6.5	−5.4%
120	125	135	260	103	−17.0	−14.2%
120	120	145	265	112.6	−7.4	−6.2%
120	120	150	270	169.8	49.8	41.5%
125	135	120	255	113.5	−11.5	−9.2%
125	130	130	260	130	5.0	4.0%
125	120	145	265	112.6	−12.4	−9.9%
125	120	150	270	169.8	44.8	35.8%
130	130	120	250	144	14.0	10.8%
130	135	120	255	113.5	−16.5	−12.7%
130	130	130	260	130	0.0	0.0%
130	125	140	265	146.7	16.7	12.8%
135	130	120	250	144	9.0	6.7%
135	135	120	255	113.5	−21.5	−15.9%
140	140	105	245	39.1	−100.9	−72.1%
140	130	120	250	144	4.0	2.9%

CD	Space	Pitch	Gap	ADI	Gap Error		Correction
125	130	255	200	172	−28.0	−14.00%	−10
125	130	255	210	190.8	−19.2	−9.14%	−10
125	130	255	220	199.7	−20.3	−9.23%	−10
125	130	255	230	207	−23.0	−10.00%	−10
125	130	255	240	215.3	−24.7	−10.29%	−5
125	130	255	250	230.6	−19.4	−7.76%	0
125	135	260	200	170.7	−29.3	−14.65%	−10
125	135	260	210	190.2	−19.8	−9.43%	−15
125	135	260	220	199.3	−20.7	−9.41%	−10
125	135	260	230	206.7	−23.3	−10.13%	−10
125	135	260	240	215.1	−24.9	−10.38%	−5
125	135	260	250	230.7	−19.3	−7.72%	0
130	125	255	200	168.4	−31.6	−15.80%	−15
130	125	255	210	186.8	−23.2	−11.05%	−15
130	125	255	220	195.8	−24.2	−11.00%	−15
130	125	255	230	203.8	−26.2	−11.39%	−10
130	125	255	240	211.7	−28.3	−11.79%	−5
130	125	255	250	225.2	−24.8	−9.92%	0
130	135	265	200	166.5	−33.5	−16.75%	−15
130	135	265	210	185.7	−24.3	−11.57%	−15
130	135	265	220	194.8	−25.2	−11.45%	−15
130	135	265	230	203.1	−26.9	−11.70%	−10
130	135	265	240	211.1	−28.9	−12.04%	−5
130	135	265	250	225.3	−24.7	−9.88%	0
135	130	265	200	168.2	−31.8	−15.90%	−10
135	130	265	210	188.8	−21.2	−10.10%	−15
135	130	265	220	198.4	−21.6	−9.82%	−10
135	130	265	230	206.2	−23.8	−10.35%	−10
135	130	265	240	214.5	−25.5	−10.63%	−5
135	130	265	250	229.2	−20.8	−8.32%	0
135	135	270	200	168	−32.0	−16.00%	−10
135	135	270	210	189	−21.0	−10.00%	−15

CD	Space	Pitch	Target-Gap	Corrected-Gap	ADI	Gap Error
125	130	255	200	220	199.7	−0.3	−0.15%
125	130	255	210	230	207	−3.0	−1.43%
125	130	255	220	240	215.3	−4.7	−2.14%
125	130	255	230	240	215.3	−14.7	−6.39%
125	130	255	240	250	230.6	−9.4	−3.92%
125	130	255	250	250	230.6	−19.4	−7.76%
125	135	260	200	220	199.3	−0.7	−0.35%
125	135	260	210	240	215.1	5.1	2.43%
125	135	260	220	240	215.1	−4.9	−2.23%
125	135	260	230	250	230.7	0.7	0.30%
125	135	260	240	250	230.7	−9.3	−3.88%
125	135	260	250	250	230.7	−19.3	−7.72%
130	125	255	200	230	203.8	3.8	1.90%
130	125	255	210	240	211.7	1.7	0.81%
130	125	255	220	250	225.2	5.2	2.36%
130	125	255	230	250	225.2	−4.8	−2.09%
130	125	255	240	250	225.2	−14.8	−6.17%
130	125	255	250	250	225.2	−24.8	−9.92%
130	135	265	200	230	203.1	3.1	1.55%
130	135	265	210	240	211.1	1.1	0.52%
130	135	265	220	250	225.3	5.3	2.41%
130	135	265	230	250	225.3	−4.7	−2.04%
130	135	265	240	250	225.3	−14.7	−6.13%
130	135	265	250	250	225.3	−24.7	−9.88%
135	130	265	200	220	198.4	−1.6	−0.80%
135	130	265	210	240	214.5	4.5	2.14%
135	130	265	220	240	214.5	−5.5	−2.50%
135	130	265	230	250	229.2	−0.8	−0.35%
135	130	265	240	250	229.2	−10.8	−4.50%
135	130	265	250	250	229.2	−20.8	−8.32%
135	135	270	200	220	198.5	−1.5	−0.75%
135	135	270	210	240	214.5	4.5	2.14%

Target-CD	Space	Pitch	ADI CD	CD Error		Correction
120	135	255	43.7	−76.3	−63.6%	$+ 15$
120	140	260	95.5	−24.5	−20.4%	$+ 5$
120	145	265	112.6	−7.4	−6.2%	0
120	150	270	169.8	49.8	41.5%	0
125	130	255	76.1	−48.9	−39.1%	$+ 10$
125	135	260	103	−22.0	−17.6%	$+ 5$
125	140	265	146.7	21.7	17.4%	−5
125	145	270	178.2	53.2	42.6%	−5
130	120	250	144	14.0	10.8%	0
130	125	255	102.9	−27.1	−20.8%	$+ 5$
130	130	260	130	0.0	0.0%	0
130	135	265	175.8	45.8	35.2%	−5
135	115	250	97.5	−37.5	−27.8%	−5
135	120	255	113.5	−21.5	−15.9%	0
140	105	245	39.1	−100.9	−72.1%	0
140	110	250	90.3	−49.7	−35.5%	−10

Abstract

Data availability

Cited By

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Tables (4)

Equations (4)

Applied Optics