Polarization calibration source for the Polstar spectropolarimeter

Robert A. Woodruff

doi:10.1364/AO.514517

Applied Optics
Vol. 63,
Issue 7,
pp. 1710-1718
(2024)
•https://doi.org/10.1364/AO.514517

Polarization calibration source for the Polstar spectropolarimeter

Robert A. Woodruff

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Robert A. Woodruff, "Polarization calibration source for the Polstar spectropolarimeter," Appl. Opt. 63, 1710-1718 (2024)

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Table of Contents Category
- Instrumentation and Measurements
Optics & Photonics Topics
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About this Article
History
- Original Manuscript: November 27, 2023
- Revised Manuscript: January 21, 2024
- Manuscript Accepted: January 30, 2024
- Published: February 21, 2024

Abstract

This paper describes material and configuration trades for the design of a special source that will be used for pre-launch calibrations of Polstar: the polarization calibration source (PCS). The PCS generates a highly polarized imaged beam at the ${f}/\#$ of Polstar. The PCS will be used to calibrate Polstar polarimetrically, photometrically, and spectrally. This paper identifies design approaches that permit the production of highly polarized light to wavelengths as small as 110 nm.

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Data availability

No data were generated or analyzed in the presented research.

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Pair of Noted Mirrors at the Same AOI
	$δ < 10^{- 5}$					$R_{s} / R_{p} > 10^{4}$
	$λ λ$	$θ$ (deg)	$λ λ$	$δ$	$θ$ (deg)	Achievable for
eLiF 265C	$λ > 120 n m$	57.0	$λ > 110 n m$	$δ < 6 * 10^{- 5}$	$\sim 57.7$	$λ > 110 n m$
LiF RT	$λ > 120 n m$	57.0	$λ > 110 n m$	$δ < 5 * 10^{- 5}$	$\sim 58.0$	$λ > 110 n m$
${A l F}_{3}$	$λ > 130 n m$	55.6	$λ > 120 n m$	$δ < 5 * 10^{- 5}$	56.5	$λ > 120 n m$
${M g F}_{2}$ 250C	$λ > 130 n m$	56.8	$λ > 120 n m$	$δ < 4 * 10^{- 5}$	57.5	$λ > 130 n m$

Pair Combined with Two SiC mirrors: All at the Same AOI
	$δ < 10^{- 5}$		$R_{s}$		$R_{s} / R_{p} > 10^{5}$	$R_{s} / R_{p} > 10^{6}$
	$λ λ$	$θ$ (deg)	110 nm	120 nm	Achievable for	Achievable for
eLiF 265C	$λ > 110 n m$	58.25	0.026	0.018	$λ > 110 n m$	$λ > 110 n m$
LiF RT	$λ > 110 n m$	59.0	0.031	0.022	$λ > 110 n m$	$λ > 110 n m$
${A l F}_{3}$	$λ > 120 n m$	56.35	0.026	0.018	$λ > 110 n m$	$λ > 120 n m$
${M g F}_{2}$ 250C	$λ > 120 n m$	57.4	0.042	0.023	$λ > 110 n m$	$λ > 120 n m$
			$R_{s}$
	$λ λ$	$θ$ (deg)	110 nm	120 nm
${A l F}_{3}$	$λ > 110 n m$	58.25	0.031	0.022	$δ < 10^{- 4}$
${M g F}_{2}$ 250C	$λ > 110 n m$	60.4	0.054	0.032	$δ < 2 * 10^{- 4}$

Pair of Noted Mirrors at the Same AOI
	$δ < 10^{- 5}$					$R_{s} / R_{p} > 10^{4}$
	$λ λ$	$θ$ (deg)	$λ λ$	$δ$	$θ$ (deg)	Achievable for
eLiF 265C	$λ > 120 n m$	57.0	$λ > 110 n m$	$δ < 6 * 10^{- 5}$	$\sim 57.7$	$λ > 110 n m$
LiF RT	$λ > 120 n m$	57.0	$λ > 110 n m$	$δ < 5 * 10^{- 5}$	$\sim 58.0$	$λ > 110 n m$
${A l F}_{3}$	$λ > 130 n m$	55.6	$λ > 120 n m$	$δ < 5 * 10^{- 5}$	56.5	$λ > 120 n m$
${M g F}_{2}$ 250C	$λ > 130 n m$	56.8	$λ > 120 n m$	$δ < 4 * 10^{- 5}$	57.5	$λ > 130 n m$

Pair Combined with Two SiC mirrors: All at the Same AOI
	$δ < 10^{- 5}$		$R_{s}$		$R_{s} / R_{p} > 10^{5}$	$R_{s} / R_{p} > 10^{6}$
	$λ λ$	$θ$ (deg)	110 nm	120 nm	Achievable for	Achievable for
eLiF 265C	$λ > 110 n m$	58.25	0.026	0.018	$λ > 110 n m$	$λ > 110 n m$
LiF RT	$λ > 110 n m$	59.0	0.031	0.022	$λ > 110 n m$	$λ > 110 n m$
${A l F}_{3}$	$λ > 120 n m$	56.35	0.026	0.018	$λ > 110 n m$	$λ > 120 n m$
${M g F}_{2}$ 250C	$λ > 120 n m$	57.4	0.042	0.023	$λ > 110 n m$	$λ > 120 n m$
			$R_{s}$
	$λ λ$	$θ$ (deg)	110 nm	120 nm
${A l F}_{3}$	$λ > 110 n m$	58.25	0.031	0.022	$δ < 10^{- 4}$
${M g F}_{2}$ 250C	$λ > 110 n m$	60.4	0.054	0.032	$δ < 2 * 10^{- 4}$

Abstract

Data availability

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Figures (12)

Tables (2)

Applied Optics