Abstract

X-ray photoelectron spectroscopy has been employed to study the effect of CF₄ rf plasmas on gold surfaces. The data indicate that the CF₄ plasma converts the inert gold surface into a chemically active surface composed of gold, gold oxide, and gold fluoride. Upon exposure to air, the gold fluoride is hydrolyzed. The modified surface actively adsorbs water. The significance of the results is discussed in terms of micro-electronic reliability considerations.

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