Abstract

The behaviors of some halides of carbon (CF₄, CCl₄, CF₃Cl, and Teflon), silicon (SiF₄ and SiCl₄), and boron (BF₃) in plasma reactors have been investigated by emission spectroscopy. The emission spectra from these compounds have been identified and arise from excited diatomic molecules SiF, SiO, BO, C₂, and CN and excited atoms of Si, B, and C. On the basis of the observed spectra and energetic and thermodynamic arguments, it is concluded that dissociation, excitation, and/or ionization processes requiring 25–30 eV are predominant in the plasma reactors under the experimental conditions of these studies.

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