Abstract

In an earlier paper, a spectroscopic technique was presented for studying the removal of negative photoresists from silicon wafers using a radiofrequency (RF) oxygen plasma. The potential application of the technique to a wide variety of manufacturing situations became quite evident especially for monitoring and controlling various stripping and etching operations induced by highly energetic plasma. It was also evident that if the technique was to enjoy wide usage in the manufacture of various integrated circuits, for example, a much more compact detection system would be necessary. Two rather versatile devices satisfying this need are described briefly here.

Low propagation loss AlGaAs waveguides fabricated with plasma-assisted photoresist reflow

Gyorgy A. Porkolab, Paveen Apiratikul, Bohan Wang, S. H. Guo, and Christopher J. K. Richardson
Opt. Express 22(7) 7733-7743 (2014)

Direct laser writing for micro-optical devices using a negative photoresist

Naoto Tsutsumi, Junichi Hirota, Kenji Kinashi, and Wataru Sakai
Opt. Express 25(25) 31539-31551 (2017)

Detection of atomic oxygen in a plasma-assisted flame via a backward lasing technique

Pengji Ding, Maria Ruchkina, Davide Del Cont-Bernard, Andreas Ehn, Deanna A. Lacoste, and Joakim Bood
Opt. Lett. 44(22) 5477-5480 (2019)

Photonic molecules defined by SU-8 photoresist strips on a photonic crystal waveguide

Stephen A. Lennon, Frederic S. F. Brossard, Luke P. Nuttall, Jiang Wu, Jonathan Griffiths, and Robert A. Taylor
Opt. Express 26(24) 32332-32345 (2018)

Optical Projection System Design for Photoresist Exposure

Milton D. Rosenau, Robert A. Jones, and Leon Contente
Appl. Opt. 8(1) 75-78 (1969)