Abstract

One problem associated with the emission spectrographic analysis of low level trace constituents in high purity quartz or glasses is that of sampling. It is often difficult to ensure that the detected impurities do not result from surface contamination introduced before or during sampling.

Pulsed laser cleaning of C contamination on a glass insulator surface

Chunhua Fang, Tao Hu, Ziheng Pu, Peng Li, and Tian Wu
Appl. Opt. 62(18) 4727-4739 (2023)

Surface evaluation and evolution during hydrodynamic effect polishing for quartz glass

Wenqiang Peng, Chaoliang Guan, and Shengyi Li
Appl. Opt. 53(29) 6913-6919 (2014)

Ultraviolet laser contamination of quartz optics

M. M. Hills and D. J. Coleman
Appl. Opt. 32(22) 4174-4177 (1993)

Photonic crystal enhanced fluorescence using a quartz substrate to reduce limits of detection

Anusha Pokhriyal, Meng Lu, Vikram Chaudhery, Cheng-Sheng Huang, Stephen Schulz, and Brian T. Cunningham
Opt. Express 18(24) 24793-24808 (2010)

XPS analysis of metallic trace contaminations on fused silica surfaces induced by classical optics manufacturing

Robert Köhler and Christoph Gerhard
Opt. Mater. Express 11(11) 3844-3853 (2021)