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Optica Publishing Group
  • Applied Spectroscopy
  • Vol. 48,
  • Issue 6,
  • pp. 674-677
  • (1994)

Spectroscopic Properties of WO3 Thin Films: Polarized FT-IR/ATR, X-ray Diffraction, and Electronic Absorption

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Abstract

The Fourier transform infrared/micro-attenuated total reflectance (FTIR/mATR), X-ray diffraction (XRD), and electronic absorption properties of thin tungsten oxide films are characterized. Thin films of tungsten oxide (100-500Å) deposited on SiO<sub>2</sub> exhibit a different orientation or structure than thicker films. A <i>p</i>-polarized longitudinal optical (LO) mode at 970 cm<sup>-1</sup> occurs in all ATR spectra of WO<sup>3</sup> thin films and is one of the strongest IR bands in the spectra. The spectroscopic properties of tungsten oxide films are characterized as a function of substrate and heat treatment.

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