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Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 6,
  • Issue 3,
  • pp. 183-185
  • (2008)

Study on hydrogen sulfide plasma passivation of 790-nm laser diode cavity surface

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Abstract

In order to improve the optical properties of the III-V laser diodes (LDs) by means of H2S plasma passivation technology, H2S plasma passivation treatment is performed on the GaAs(110) surface. The optimum passivation conditions obtained are 60-W radio frequency (RF) power and 20-min duration. So the laser cavity surfaces are treated under the optimum passivation conditions. Consequently, compared with unpassivated lasers with only AR/HR-coatings, the catastrophic optical damage (COD) threshold value of the passivated lasers by H2S plasma treatment is increased by 33%, which is almost the same as that of (NH4)2Sx treatment. And the life-test experiment has demonstrated that this passivation method is more stable than (NH4)2Sx solution wet-passivated treatment.

© 2008 Chinese Optics Letters

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